SCHEMBL9497653

SCHEMBL9497653

O=[As](O)(O)O[I+](c1ccccc1)c1ccccc1

nearest known ligand 0.41

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
CA4 P22748 2/20 0.41
CA6 P23280 1/20 0.41
CA7 P43166 1/20 0.41
CA9 Q16790 1/20 0.41
CA14 Q9ULX7 1/20 0.41
TDP1 Q9NUW8 3/20 0.35
MAPT P10636 1/20 0.33
GAA P10253 1/20 0.31
F2 P00734 1/20 0.30
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL105150 0.67 F2 (0.37) CA4CA6CA7CA9CA14
SCHEMBL108408 0.67 F2 (0.37) CA4CA6CA7CA9CA14
SCHEMBL107584 0.64 ALDH1A1 (0.42) TDP1MAPTGAAF2LMNA
SCHEMBL367452 0.64 CA4 (0.46) CA4CA6CA7CA9CA14
SCHEMBL107087 0.62 TDP1 (0.39) TDP1MAPTLMNA
SCHEMBL106423 0.62 MAPT (0.41) TDP1MAPTF2LMNA
SCHEMBL107606 0.62 LMNA (0.54) TDP1MAPTF2LMNA
SCHEMBL103689 0.62 MAPT (0.41) TDP1MAPTF2LMNA
SCHEMBL103573 0.62 LMNA (0.48) TDP1MAPTGAAF2LMNA
SCHEMBL105296 0.62 ALDH1A1 (0.42) CA4CA6CA7CA9CA14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118271977-A Optical cement, circular polarizer and display device 陕西晶彩明为科技有限公司 2024-07-02 CN claimed
CN-117826308-A Optical film and preparation method thereof 陕西晶彩明为科技有限公司 2024-04-05 CN claimed
CN-114835996-B High-barrier blue liquid crystal film and preparation method thereof 广州光驭超材料有限公司 2022-12-13 CN claimed
CN-115267955-A Visual angle regulation and control film, preparation method thereof and printing roller 北京海川利元材料科技有限公司 2022-11-01 CN claimed
CN-114193896-B Thermochromic film and preparation method and application thereof 广州光驭超材料有限公司 2022-10-21 CN claimed
CN-114835996-A High-barrier blue liquid crystal film and preparation method thereof 广州光驭超材料有限公司 2022-08-02 CN claimed
CN-114193896-A Thermochromic film and preparation method and application thereof 广州光驭超材料有限公司 2022-03-18 CN claimed
CN-111574715-A Composition, packaging film containing composition, preparation method of packaging film and electronic device 中国乐凯集团有限公司 2020-08-25 CN claimed
CN-120195795-A Circular polarizer with improved light-emitting efficiency and display device 陕西晶彩明为科技有限公司 2025-06-24 CN disclosed
CN-119916602-A Circular polarizer and display device based on visual angle compensation 陕西晶彩明为科技有限公司 2025-05-02 CN disclosed
CN-119882119-A Circular polarizer and display device 陕西晶彩明为科技有限公司 2025-04-25 CN disclosed
CN-118404882-A Brightness enhancement film, circular polarizer and display device 陕西晶彩明为科技有限公司 2024-07-30 CN disclosed
CN-118271977-A Optical cement, circular polarizer and display device 陕西晶彩明为科技有限公司 2024-07-02 CN disclosed
CN-117826308-A Optical film and preparation method thereof 陕西晶彩明为科技有限公司 2024-04-05 CN disclosed
CN-114193896-B Thermochromic film and preparation method and application thereof 广州光驭超材料有限公司 2022-10-21 CN disclosed
CN-114835996-A High-barrier blue liquid crystal film and preparation method thereof 广州光驭超材料有限公司 2022-08-02 CN disclosed
CN-114193896-A Thermochromic film and preparation method and application thereof 广州光驭超材料有限公司 2022-03-18 CN disclosed
CN-111574715-A Composition, packaging film containing composition, preparation method of packaging film and electronic device 中国乐凯集团有限公司 2020-08-25 CN disclosed
CN-109423275-B Quantum dot composition, quantum dot luminescent material, preparation method thereof and luminescent device containing quantum dot luminescent material 纳晶科技股份有限公司 2020-03-31 CN disclosed
US-5250395-A Coating substrate with film of blocked polymer and aromatic dye, exposing to electromagnetic radiation, contacting with organometallic compound to form etch barrier, etching with reactive ions INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1993-10-05 US disclosed