SCHEMBL9498329

SCHEMBL9498329

CCCc1ccc(C(O)CC)cc1

nearest known ligand 0.56

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.56
LPL P06858 1/20 0.47
LIPG Q9Y5X9 1/20 0.47
ACACB O00763 2/20 0.41
PLK1 P53350 1/20 0.41
ADRB2 P07550 1/20 0.41
CNR1 P21554 1/20 0.41
CNR2 P34972 1/20 0.41
THRB P10828 2/20 0.40
CA2 P00918 1/20 0.39
PGR P06401 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
KMT2A Q03164 1/20 0.39
ACACA Q13085 1/20 0.39
ESR1 P03372 1/20 0.38
ESR2 Q92731 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9500269 0.94 LMNA (0.50) LMNALPLLIPGACACBPLK1
SCHEMBL9500260 0.88 LMNA (0.52) LMNALPLLIPGPLK1THRB
SCHEMBL547630 0.87 LMNA (0.56) LMNALPLLIPGADRB2CA2
SCHEMBL9500266 0.86 ESR1 (0.55) LMNALPLLIPGESR1
Phenylpropanol SCHEMBL2321402 0.86 LMNA (0.73) LMNAL3MBTL1
Phenylpropanol SCHEMBL10627644 0.86 LMNA (0.73) LMNAL3MBTL1
SCHEMBL9336400 0.85 LPL (0.45) LMNALPLLIPGACACBPLK1
SCHEMBL9499018 0.84 ESR1 (0.58) LMNALPLLIPGESR1
SCHEMBL9498144 0.84 ESR1 (0.58) LMNALPLLIPGESR1
SCHEMBL9499420 0.84 ESR1 (0.58) LMNALPLLIPGESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109690361-A Optical component forms composition 三菱瓦斯化学株式会社 2019-04-26 CN disclosed
CN-107533290-A RESIST BASE MATERIAL, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN 三菱瓦斯化学株式会社 2018-01-02 CN disclosed
CN-107407874-A Radiation-sensitive composition, amorphous film and corrosion-resisting pattern forming method 三菱瓦斯化学株式会社 2017-11-28 CN disclosed
CN-106957217-A Polyphenol compound for anti-corrosion agent composition 三菱瓦斯化学株式会社 2017-07-18 CN disclosed
US-20170154766-A1 SILICON-CONTAINING CONDENSATE, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-01 US disclosed
EP-0354655-B1 1-PHENYL-1-PROPANOL DERIVATIVES CHISSO CORPORATION (JP) 1993-04-07 EP disclosed
US-5076947-A Optically active; free from temperature dependence CHISSO CORPORATION (JP) 1991-12-31 US disclosed
EP-0354655-A2 1-Phenyl-1-propanol derivatives CHISSO CORPORATION (JP) 1990-02-14 EP disclosed