Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 4/20 | 0.55 |
| ▸ | ACHE | P22303 | 1/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.48 |
| ▸ | GAA | P10253 | 3/20 | 0.46 |
| ▸ | GLA | P06280 | 2/20 | 0.46 |
| ▸ | MAPT | P10636 | 4/20 | 0.46 |
| ▸ | POLB | P06746 | 1/20 | 0.46 |
| ▸ | PKM | P14618 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.45 |
| ▸ | MEN1 | O00255 | 1/20 | 0.45 |
| ▸ | TTR | P02766 | 1/20 | 0.45 |
| ▸ | TP53 | P04637 | 1/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
| ▸ | ELANE | P08246 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9760614 | 0.95 | LMNA (0.53) | LMNAACHEKDM4EKMT2AGAA | |
| SCHEMBL11577550 | 0.93 | ACHE (0.54) | LMNAACHEKDM4EKMT2AGAA | |
| SCHEMBL29535063 | 0.87 | KDM4E (0.58) | LMNAACHEKDM4EKMT2AGAA | |
| SCHEMBL2541390 | 0.87 | KDM4E (0.58) | LMNAACHEKDM4EKMT2AGAA | |
| SCHEMBL1490220 | 0.87 | ACHE (0.46) | LMNAACHEKDM4EKMT2AGAA | |
| SCHEMBL14700586 | 0.86 | KMT2A (0.49) | LMNAACHEKDM4EKMT2AGAA | |
| SCHEMBL3326684 | 0.84 | ACHE (0.53) | LMNAACHEKDM4EKMT2AGAA | |
| SCHEMBL10449007 | 0.80 | MAPT (0.50) | LMNAACHEKDM4EKMT2AMAPT | |
| SCHEMBL31086822 | 0.80 | MAPT (0.50) | LMNAACHEKDM4EKMT2AMAPT | |
| SCHEMBL5338819 | 0.80 | HTT (0.45) | LMNAACHEKDM4EKMT2AMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0212482-B1 | PROCESS FOR OBTAINING NEGATIVE IMAGES FROM POSITIVE PHOTORESISTS | HOECHST CELANESE CORPORATION (US) | 1989-04-19 | — | — | EP | claimed |
| EP-0311387-B1 | AROMATIC AMINE RESINS, THEIR PRODUCTION PROCESS AND THERMOSETTING RESIN COMPOSITIONS MAKING USE OF THE SAME | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1993-08-11 | — | — | EP | disclosed |
| EP-0342943-B1 | THERMOSETTING RESIN COMPOSITION | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1993-08-04 | — | — | EP | disclosed |
| US-5145949-A | Production process for making aromatic amine resins | MITSUI TOATSU CHEMICALS, INC. (JP) | 1992-09-08 | — | — | US | disclosed |
| US-5122442-A | Water soluble binder; photosensitive compound | HOECHST CELANESE CORPORATION (US) | 1992-06-16 | — | — | US | disclosed |
| US-5106953-A | Reacting aromatic amines with bishalogenomethyl derivatives; curing agents or raw materials for polyamides | MITSUI TOATSU CHEMICALS, INC. (JP) | 1992-04-21 | — | — | US | disclosed |
| US-5051494-A | A bismaleimide and an amino resin | MITSUI TOATSU CHEMICALS, INC. (JP) | 1991-09-24 | — | — | US | disclosed |
| US-4959443-A | HIGH STRENGTH, REACTION OF ARALKYL ALCOHOL AND AROMATIC AMINE | MITSUI TOATSU CHEMICALS, INC. (JP) | 1990-09-25 | — | — | US | disclosed |
| US-4937318-A | Aromatic amine resins | MITSUI TOATSU CHEMICALS, INC. (JP) | 1990-06-26 | — | — | US | disclosed |
| EP-0342943-A1 | Thermosetting resin composition | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-11-23 | — | — | EP | disclosed |
| EP-0212482-B1 | PROCESS FOR OBTAINING NEGATIVE IMAGES FROM POSITIVE PHOTORESISTS | HOECHST CELANESE CORPORATION (US) | 1989-04-19 | — | — | EP | disclosed |
| EP-0106156-B1 | LIGHT-SENSITIVE COMPOSITION | HOECHST CELANESE CORPORATION (US) | 1988-12-21 | — | — | EP | disclosed |
| EP-0212482-A2 | Process for obtaining negative images from positive photoresists | HOECHST CELANESE CORPORATION (US) | 1987-03-04 | — | — | EP | disclosed |
| EP-0061150-B1 | LIGHT-SENSITIVE POLYCONDENSATION PRODUCT, PROCESS FOR ITS PREPARATION AND LIGHT-SENSITIVE RECORDING MATERIAL CONTAINING THE SAME | AMERICAN HOECHST CORPORATION (US) | 1986-10-15 | — | — | EP | disclosed |
| EP-0098982-B1 | PHOTOPOLYMERIZABLE MIXTURE, AND PHOTOPOLYMERIZABLE COPYING MATERIAL PRODUCED THEREWITH | HOECHST AKTIENGESELLSCHAFT (DE) | 1986-08-06 | — | — | EP | disclosed |
| US-4458006-A | PRINTING PLATES | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-07-03 | — | — | US | disclosed |
| EP-0106156-A2 | Light-sensitive composition | HOECHST CELANESE CORPORATION (US) | 1984-04-25 | — | — | EP | disclosed |
| EP-0098982-A1 | Photopolymerizable mixture, and photopolymerizable copying material produced therewith | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-01-25 | — | — | EP | disclosed |
| EP-0061150-A1 | Light-sensitive polycondensation product, process for its preparation and light-sensitive recording material containing the same | AMERICAN HOECHST CORPORATION (US) | 1982-09-29 | — | — | EP | disclosed |