SCHEMBL9506534

SCHEMBL9506534

C=CC(=O)NCOCC1CCCO1

nearest known ligand 0.44

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.44
POLB P06746 1/20 0.44
ALDH1A1 P00352 1/20 0.42
SMN1; SMN2 Q16637 2/20 0.41
USP2 O75604 1/20 0.41
HPGD P15428 5/20 0.40
TP53 P04637 1/20 0.40
ALOX12 P18054 1/20 0.40
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
HTT P42858 1/20 0.38
MCL1 Q07820 1/20 0.37
CYP3A4 P08684 1/20 0.36
CYP2D6 P10635 1/20 0.36
CYP2C9 P11712 1/20 0.36
PKM P14618 1/20 0.36
CYP2C19 P33261 1/20 0.36
NPC1 O15118 1/20 0.36
RAB9A P51151 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10395061 0.90 LMNA (0.37) LMNAPOLBALDH1A1SMN1; SMN2USP2
SCHEMBL10804664 0.83 LMNA (0.43) LMNAPOLBALDH1A1SMN1; SMN2USP2
SCHEMBL183484 0.83 ALDH1A1 (0.47) LMNAALDH1A1SMN1; SMN2TP53KMT2A
SCHEMBL368181 0.80 SMN1; SMN2 (0.58) LMNAALDH1A1SMN1; SMN2USP2HPGD
SCHEMBL9507904 0.78 LMNA (0.43) LMNAPOLBALDH1A1SMN1; SMN2USP2
SCHEMBL368274 0.77 USP2 (0.44) LMNAALDH1A1SMN1; SMN2USP2HPGD
SCHEMBL15753734 0.75 SMN1; SMN2 (0.53) ALDH1A1SMN1; SMN2USP2HPGDTP53
SCHEMBL233284 0.73 TSHR (0.51) LMNAPOLBALDH1A1HPGDTP53
SCHEMBL26837 0.73 LMNA (0.58) LMNAPOLBALDH1A1
SCHEMBL12430294 0.72 TSHR (0.50) LMNAPOLBALDH1A1HPGDTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0358479-B1 WATER-BASED PHOTOPOLYMERIZABLE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 1993-08-11 EP claimed
US-4933260-A Water based photopolymerizable resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 1990-06-12 US claimed
EP-0358479-A1 Water-based photopolymerizable resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 1990-03-14 EP claimed
EP-0358479-B1 WATER-BASED PHOTOPOLYMERIZABLE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 1993-08-11 EP disclosed
US-4933260-A Water based photopolymerizable resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 1990-06-12 US disclosed
US-4933260-A Water based photopolymerizable resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 1990-06-12 US disclosed
EP-0358479-A1 Water-based photopolymerizable resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 1990-03-14 EP disclosed
EP-0358479-A1 Water-based photopolymerizable resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 1990-03-14 EP disclosed