SCHEMBL9507872

SCHEMBL9507872

CCOc1ccc(Oc2ccc(OCC)cc2C)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NQO1 P15559 1/20 0.54
MAPT P10636 3/20 0.53
LTA4H P09960 2/20 0.52
LMNA P02545 1/20 0.50
ATM Q13315 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
SLC6A2 P23975 1/20 0.46
SLC6A4 P31645 1/20 0.46
SLC6A3 Q01959 1/20 0.46
CACNA1C Q13936 1/20 0.46
TSHR P16473 1/20 0.45
TDP1 Q9NUW8 1/20 0.45
ALDH1A1 P00352 3/20 0.44
KDM4E B2RXH2 2/20 0.41
HPGD P15428 1/20 0.41
MEN1 O00255 1/20 0.41
NPC1 O15118 1/20 0.41
KMT2A Q03164 1/20 0.41
APOBEC3G Q9HC16 1/20 0.41
TP53 P04637 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18570814 0.86 CACNA1C (0.54) NQO1MAPTLTA4HLMNAATM
SCHEMBL1911836 0.86 NQO1 (0.54) NQO1MAPTTSHRTDP1ALDH1A1
SCHEMBL8637011 0.84 MAPT (0.44) NQO1MAPTLTA4HLMNAATM
SCHEMBL8633956 0.84 MAPT (0.41) NQO1MAPTLTA4HLMNAATM
SCHEMBL16953203 0.82 ALDH1A1 (0.56) NQO1MAPTLMNATSHRALDH1A1
SCHEMBL9509154 0.80 ACACB (0.46) MAPTLMNAATML3MBTL1TSHR
SCHEMBL3753855 0.79 NQO1 (0.46) NQO1MAPTTSHRTDP1ALDH1A1
SCHEMBL19627290 0.78 MAPT (0.45) NQO1MAPTLTA4HLMNAATM
SCHEMBL16955559 0.78 NQO1 (0.45) NQO1TSHRTDP1ALDH1A1KDM4E
SCHEMBL143430 0.77 NQO1 (0.59) NQO1MAPTLTA4HATMTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0311387-B1 AROMATIC AMINE RESINS, THEIR PRODUCTION PROCESS AND THERMOSETTING RESIN COMPOSITIONS MAKING USE OF THE SAME MITSUI TOATSU CHEMICALS, Inc. (JP) 1993-08-11 EP disclosed
US-5145949-A Production process for making aromatic amine resins MITSUI TOATSU CHEMICALS, INC. (JP) 1992-09-08 US disclosed
US-5106953-A Reacting aromatic amines with bishalogenomethyl derivatives; curing agents or raw materials for polyamides MITSUI TOATSU CHEMICALS, INC. (JP) 1992-04-21 US disclosed
US-5051494-A A bismaleimide and an amino resin MITSUI TOATSU CHEMICALS, INC. (JP) 1991-09-24 US disclosed
US-4937318-A Aromatic amine resins MITSUI TOATSU CHEMICALS, INC. (JP) 1990-06-26 US disclosed
EP-0212482-B1 PROCESS FOR OBTAINING NEGATIVE IMAGES FROM POSITIVE PHOTORESISTS HOECHST CELANESE CORPORATION (US) 1989-04-19 EP disclosed
EP-0106156-B1 LIGHT-SENSITIVE COMPOSITION HOECHST CELANESE CORPORATION (US) 1988-12-21 EP disclosed
EP-0212482-A2 Process for obtaining negative images from positive photoresists HOECHST CELANESE CORPORATION (US) 1987-03-04 EP disclosed
EP-0106156-A2 Light-sensitive composition HOECHST CELANESE CORPORATION (US) 1984-04-25 EP disclosed