⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13536885 | 0.81 | — | — | |
| SCHEMBL12808614 | 0.78 | — | — | |
| SCHEMBL10228014 | 0.77 | — | — | |
| SCHEMBL13499238 | 0.77 | — | — | |
| SCHEMBL11547191 | 0.77 | — | — | |
| SCHEMBL1919830 | 0.76 | — | — | |
| SCHEMBL11998333 | 0.74 | TSHR (0.60) | — | |
| Malonic Acid SCHEMBL2509322 | 0.74 | LDHA (0.69) | — | |
| Malonic Acid SCHEMBL2412964 | 0.74 | LDHA (0.69) | — | |
| SCHEMBL14571771 | 0.72 | LDHA (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115279800-B | Method for producing polyvinyl alcohol resin | 三菱化学株式会社 | 2024-01-09 | — | — | CN | disclosed |
| EP-0279630-B1 | DEVELOPER FOR LIGHT-SENSITIVE LITHOGRAPHIC PRINTING PLATE CAPABLE OF PROCESSING COMMONLY THE NEGATIVE-TYPE AND THE POSITIVE TYPE AND DEVELOPER COMPOSITION FOR LIGHT-SENSITIVE MATERIAL | KONICA CORPORATION (JP) | 1993-10-13 | — | — | EP | disclosed |
| US-5106724-A | High speed, odorless | KONICA CORPORATION (JP) | 1992-04-21 | — | — | US | disclosed |
| EP-0279630-A1 | Developer for light-sensitive lithographic printing plate capable of processing commonly the negative-type and the positive type and developer composition for light-sensitive material | KONICA CORPORATION (JP) | 1988-08-24 | — | — | EP | disclosed |