Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetone SCHEMBL11650302 | 0.90 | — | — | |
| Hydrogen Peroxide SCHEMBL4369407 | 0.86 | — | — | |
| Hydrogen Peroxide SCHEMBL4365564 | 0.86 | ALDH1A1 (0.31) | — | |
| Methacrylic Acid SCHEMBL8005854 | 0.85 | ALDH1A1 (0.43) | — | |
| Carbamic Acid SCHEMBL11772614 | 0.84 | — | — | |
| Acrylic Acid SCHEMBL6856274 | 0.84 | — | — | |
| Fumaric Acid SCHEMBL460392 | 0.81 | HCAR2 (0.55) | — | |
| Fumaric Acid SCHEMBL8927919 | 0.81 | HCAR2 (0.55) | — | |
| Maleic Acid SCHEMBL8927918 | 0.81 | HCAR2 (0.55) | — | |
| Maleic Acid SCHEMBL128033 | 0.81 | HCAR2 (0.55) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108472258-B | Formulations/compositions comprising BTK inhibitors | 詹森药业有限公司 | 2024-05-24 | — | — | CN | disclosed |
| CN-1216749-C | Supporting body for lithographic plate and lithographic original plate | FUJI PHOTO FILM CO LTD (JP) | 2005-08-31 | — | — | CN | disclosed |
| CN-1378918-A | Supporting body for lithographic plate and lithographic original plate | FUJI PHOTO FILM CO LTD (JP) | 2002-11-13 | — | — | CN | disclosed |
| EP-0279630-B1 | DEVELOPER FOR LIGHT-SENSITIVE LITHOGRAPHIC PRINTING PLATE CAPABLE OF PROCESSING COMMONLY THE NEGATIVE-TYPE AND THE POSITIVE TYPE AND DEVELOPER COMPOSITION FOR LIGHT-SENSITIVE MATERIAL | KONICA CORPORATION (JP) | 1993-10-13 | — | — | EP | disclosed |
| US-5106724-A | High speed, odorless | KONICA CORPORATION (JP) | 1992-04-21 | — | — | US | disclosed |
| EP-0279630-A1 | Developer for light-sensitive lithographic printing plate capable of processing commonly the negative-type and the positive type and developer composition for light-sensitive material | KONICA CORPORATION (JP) | 1988-08-24 | — | — | EP | disclosed |