Cyclohexylamine

Cyclohexylamine

SCHEMBL953634

N.NC1(CC2(N)CCCCC2)CCCCC1.NC1CCCCC1

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27298222 0.80 MMP1 (0.31) ALDH1A1
SCHEMBL179951 0.80 TSHR (0.33)
SCHEMBL11240387 0.78 OPRL1 (0.30)
Cyclohexylamine SCHEMBL2636378 0.74
Cyclohexylamine SCHEMBL28747296 0.74 THRB (0.47) ALDH1A1
Cycloheptanamine SCHEMBL20530690 0.74
Ethylenediamine SCHEMBL27953580 0.72 USP2 (0.30) ALDH1A1
Cyclohexylamine SCHEMBL28795780 0.71 THRB (0.44) ALDH1A1
Cyclohexylamine SCHEMBL2686292 0.71
Cyclohexylamine SCHEMBL28173406 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8568954-B2 Positive photosensitive resin composition CHEIL INDUSTRIES INC. (KR) 2013-10-29 US disclosed
US-20110003248-A1 Positive photosensitive resin composition CHEIL INDUSTRIES INC. (KR) 2011-01-06 US disclosed
WO-2009116724-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION CHEIL INDUSTRIES INC. (KR) 2009-09-24 WO disclosed