SCHEMBL9543056

SCHEMBL9543056

O=Cc1ccccc1OP(=O)(O)O.O=Cc1ccccc1OS(=O)(=O)O

nearest known ligand 0.76

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SRC P12931 7/20 0.76
ALDH1A1 P00352 4/20 0.50
INPPL1 O15357 3/20 0.42
INPP5A Q14642 3/20 0.42
HPGD P15428 2/20 0.42
INPP5B P32019 2/20 0.42
HTT P42858 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
KDM4E B2RXH2 1/20 0.41
USP2 O75604 1/20 0.41
PDE3A Q14432 1/20 0.41
HSD17B10 Q99714 1/20 0.41
LMNA P02545 3/20 0.40
KMT2A Q03164 2/20 0.40
GAA P10253 1/20 0.40
PTGDR2 Q9Y5Y4 1/20 0.40
NPSR1 Q6W5P4 1/20 0.39
AKT1 P31749 1/20 0.37
CYP1A2 P05177 1/20 0.36
CYP2C9 P11712 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3514846 0.87 SRC (1.00) SRCALDH1A1INPPL1INPP5AHPGD
SCHEMBL5024306 0.87 ALDH1A1 (0.62) SRCALDH1A1HPGDHTTSMN1; SMN2
SCHEMBL11585504 0.85 ALDH1A1 (0.61) SRCALDH1A1HPGDHTTSMN1; SMN2
SCHEMBL28349910 0.85 ALDH1A1 (0.61) SRCALDH1A1HPGDHTTSMN1; SMN2
SCHEMBL7614002 0.81 ALDH1A1 (0.56) SRCALDH1A1HPGDHTTSMN1; SMN2
SCHEMBL28784658 0.78 SRC (0.81) SRCALDH1A1INPPL1INPP5AHPGD
SCHEMBL27797649 0.76 SRC (0.76) SRCALDH1A1INPPL1INPP5AHPGD
SCHEMBL3514844 0.73 SRC (0.71) SRCALDH1A1HPGDHTTSMN1; SMN2
SCHEMBL4128875 0.72 SRC (0.70) SRCALDH1A1INPPL1INPP5AHPGD
SCHEMBL731975 0.72 ALDH1A1 (0.43) SRCALDH1A1HPGDHTTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-1993003068-A1 ACID-SUBSTITUTED TERNARY ACETAL POLYMERS AND USE THEREOF IN PHOTOSENSITIVE COMPOSITIONS AND LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK COMPANY (US) 1993-02-18 WO disclosed