Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.49 |
| ▸ | HPGD | P15428 | 1/20 | 0.49 |
| ▸ | KDM4C | Q9H3R0 | 1/20 | 0.46 |
| ▸ | GAA | P10253 | 2/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | GLA | P06280 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | USP2 | O75604 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16110625 | 0.78 | CYP1A2 (0.47) | CYP1A2ALDH1A1GAAMAPK1LMNA | |
| SCHEMBL11710847 | 0.77 | MAPK1 (0.62) | ALDH1A1HPGDKDM4CGAAMAPK1 | |
| SCHEMBL829258 | 0.77 | ALDH1A1 (0.47) | CYP1A2ALDH1A1HPGDKDM4CGAA | |
| SCHEMBL11196988 | 0.77 | ALDH1A1 (0.47) | CYP1A2ALDH1A1HPGDKDM4CGAA | |
| SCHEMBL4142949 | 0.77 | ALDH1A1 (0.47) | CYP1A2ALDH1A1HPGDKDM4CGAA | |
| SCHEMBL11217089 | 0.77 | ALDH1A1 (0.47) | CYP1A2ALDH1A1HPGDKDM4CGAA | |
| SCHEMBL342613 | 0.77 | ALDH1A1 (0.47) | CYP1A2ALDH1A1HPGDKDM4CGAA | |
| SCHEMBL4609642 | 0.77 | ALDH1A1 (0.47) | CYP1A2ALDH1A1HPGDKDM4CGAA | |
| SCHEMBL8056548 | 0.75 | ALDH1A1 (0.46) | CYP1A2ALDH1A1HPGDKDM4CGAA | |
| SCHEMBL13872406 | 0.75 | KDM4C (0.55) | ALDH1A1HPGDKDM4CGAAMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120041123-A | High-flexibility temperature-resistant epoxy structural adhesive and preparation method thereof | 科秀新材料(安徽)有限公司 | 2025-05-27 | — | — | CN | claimed |
| CN-111393382-A | Preparation method of 1-tetrazole acetate | 杭州盛弗泰新材料科技有限公司 | 2020-07-10 | — | — | CN | claimed |
| CN-102382071-B | Technology for preparing 1H-tetrazoleacetic acid with deamination reduction method | SHANDONG IFT SCIENCE & TECHNOLOGY CO LTD | 2013-12-18 | — | — | CN | claimed |
| CN-102351805-B | Method for preparing, separating and refining 5-amino-1H-tetrazol-1-ylacetic acid | CHEMICAL TECHNOLOGY ACADEMY OF SHANDONG PROVINCE | 2013-12-18 | — | — | CN | claimed |
| CN-117055292-B | Negative photosensitive polyimide composition, method for producing pattern, and electronic component | 江苏艾森半导体材料股份有限公司 | 2025-06-13 | — | — | CN | disclosed |
| CN-120041123-A | High-flexibility temperature-resistant epoxy structural adhesive and preparation method thereof | 科秀新材料(安徽)有限公司 | 2025-05-27 | — | — | CN | disclosed |
| CN-113168101-B | Photosensitive resin composition, method for producing pattern cured film, interlayer insulating film, coverlay, surface protective film, and electronic component | 艾曲迪微系统股份有限公司 | 2025-02-18 | — | — | CN | disclosed |
| CN-117055288-B | Negative photosensitive polyimide composition, method for producing pattern, and electronic component | 江苏艾森半导体材料股份有限公司 | 2024-12-20 | — | — | CN | disclosed |
| US-20240402603-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, AND METHOD FOR PRODUCING LAYERED BODY | RESONAC CORPORATION (JP) | 2024-12-05 | — | — | US | disclosed |
| US-11993729-B2 | Chemical mechanical polishing composition | BASF SE (DE) | 2024-05-28 | — | — | US | disclosed |
| CN-117980821-A | Photosensitive resin composition, photosensitive element, and method for producing laminate | 株式会社力森诺科 | 2024-05-03 | — | — | CN | disclosed |
| CN-117055292-A | Negative photosensitive polyimide composition, method for producing pattern, and electronic component | 江苏艾森半导体材料股份有限公司 | 2023-11-14 | — | — | CN | disclosed |
| CN-1826323-A | 3, 4-disubstituted 1H-pyrazole compounds and their use as modulators of Cyclin Dependent Kinases (CDKs) and glycogen synthase kinase-3 (GSK-3) | ASTEX THERAPEUTICS LTD (GB) | 2006-08-30 | — | — | CN | disclosed |
| WO-2006077424-A1 | PHARMACEUTICAL COMPOUNDS | ASTEX THERAPEUTICS LIMITED (GB) | 2006-07-27 | — | — | WO | disclosed |
| WO-2006077428-A1 | PHARMACEUTICAL COMPOUNDS | ASTEX THERAPEUTICS LIMITED (GB) | 2006-07-27 | — | — | WO | disclosed |
| WO-2006077425-A1 | COMBINATIONS OF PYRAZOLE KINASE INHIBITORS AND FURTHER ANTITUMOR AGENTS | ASTEX THERAPEUTICS LIMITED (GB) | 2006-07-27 | — | — | WO | disclosed |
| EP-1651612-A1 | 3,4-DISUBSTITUTED 1H-PYRAZOLE COMPOUNDS AND THEIR USE AS CYCLIN DEPENDENT KINASES (CDK) AND GLYCOGEN SYNTHASE KINASE-3 (GSK-3) MODULATORS | Astex Therapeutics Limited (GB) | 2006-05-03 | — | — | EP | disclosed |
| WO-2005012256-A1 | 3, 4-DISUBSTITUTED 1H-PYRAZOLE COMPOUNDS AND THEIR USE AS CYCLIN DEPENDENT KINASES (CDK) AND GLYCOGEN SYNTHASE KINASE-3 (GSK-3) MODULATORS | ASTEX THERAPEUTICS LIMITED (GB) | 2005-02-10 | — | — | WO | disclosed |
| US-4324892-A | 7-(N-Substituted-2-phenylglycinamido)-3-substituted-3-cephem-4-carboxylic acid compounds | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1982-04-13 | — | — | US | disclosed |
| US-4172198-A | ANTIBIOTICS | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1979-10-23 | — | — | US | disclosed |