⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9723655 | 0.87 | — | — | |
| SCHEMBL5889823 | 0.86 | — | — | |
| SCHEMBL951543 | 0.85 | — | — | |
| SCHEMBL5944187 | 0.84 | — | — | |
| SCHEMBL86349 | 0.84 | ALDH1A1 (0.42) | — | |
| SCHEMBL9561617 | 0.83 | — | — | |
| SCHEMBL5165154 | 0.83 | DGAT1 (0.30) | — | |
| SCHEMBL10983528 | 0.82 | — | — | |
| SCHEMBL9561736 | 0.82 | — | — | |
| SCHEMBL5889505 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9842993-B2 | Film-forming composition, film formed thereby, and method for manufacturing organic semiconductor element using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-12-12 | — | — | US | disclosed |
| US-20160181531-A1 | Film-Forming Composition, Film Formed Thereby, and Method for Manufacturing Organic Semiconductor Element Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-06-23 | — | — | US | disclosed |
| US-5239027-A | Optical fibers | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-08-24 | — | — | US | disclosed |
| US-5187769-A | Comonomers of fluorinated acrylates, deuterium-substituted fluoroacrylates forming core/cladding structure of optical fibers; high glass transition temperature | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-02-16 | — | — | US | disclosed |
| EP-0501424-A1 | Transparent thermoplastic moulding composition, process for its preparation and its use | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-09-02 | — | — | EP | disclosed |
| US-4259407-A | POLYMER OF HALOGENATED ALKYL ALPHA-HALOGENATED ACRYLATE | VLSI TECHNOLOGY RESEARCH ASSOCIATION (JP) | 1981-03-31 | — | — | US | disclosed |