Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 2/20 | 0.37 |
| ▸ | CA2 | P00918 | 2/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.36 |
| ▸ | TSHR | P16473 | 3/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.32 |
| ▸ | MEN1 | O00255 | 2/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | USP2 | O75604 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.31 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9609347 | 0.98 | CA1 (0.41) | CA1CA2POLBKMT2ATSHR | |
| SCHEMBL10146446 | 0.85 | CA1 (0.38) | CA1CA2POLBKMT2ATSHR | |
| SCHEMBL21587515 | 0.85 | CA1 (0.38) | CA1CA2POLBKMT2ATSHR | |
| SCHEMBL2759961 | 0.85 | CA1 (0.38) | CA1CA2POLBKMT2ATSHR | |
| SCHEMBL190593 | 0.85 | CA1 (0.38) | CA1CA2POLBKMT2ATSHR | |
| SCHEMBL9986725 | 0.84 | CA1 (0.37) | CA1CA2POLBKMT2ATSHR | |
| SCHEMBL16519732 | 0.83 | CA1 (0.34) | CA1CA2POLBKMT2ATSHR | |
| SCHEMBL9609357 | 0.82 | CA1 (0.37) | CA1CA2POLBKMT2ATSHR | |
| SCHEMBL15925430 | 0.81 | CA1 (0.38) | CA1CA2POLBKMT2ATSHR | |
| SCHEMBL16519706 | 0.81 | CA1 (0.38) | CA1CA2POLBKMT2ATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120135348-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2012-05-31 | — | — | US | disclosed |