Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 2/20 | 0.38 |
| ▸ | CA2 | P00918 | 2/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 4/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | USP2 | O75604 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | PDK1 | Q15118 | 2/20 | 0.30 |
| ▸ | PDK2 | Q15119 | 2/20 | 0.30 |
| ▸ | PDK3 | Q15120 | 2/20 | 0.30 |
| ▸ | PDK4 | Q16654 | 2/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | ABCC9 | O60706 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL190593 | 1.00 | CA1 (0.38) | CA1CA2POLBTSHRKMT2A | |
| SCHEMBL2759961 | 1.00 | CA1 (0.38) | CA1CA2POLBTSHRKMT2A | |
| SCHEMBL9986725 | 0.98 | CA1 (0.37) | CA1CA2POLBTSHRKMT2A | |
| SCHEMBL21587515 | 0.96 | CA1 (0.38) | CA1CA2POLBTSHRKMT2A | |
| SCHEMBL9609347 | 0.88 | CA1 (0.41) | CA1CA2POLBTSHRKMT2A | |
| SCHEMBL17407603 | 0.86 | ALDH1A1 (0.32) | ALDH1A1L3MBTL1HPGD | |
| SCHEMBL13008891 | 0.86 | KDM4E (0.41) | KMT2AALDH1A1MEN1KDM4EL3MBTL1 | |
| SCHEMBL9609348 | 0.85 | CA1 (0.37) | CA1CA2POLBTSHRKMT2A | |
| SCHEMBL15383203 | 0.85 | CA1 (0.35) | CA1CA2POLBTSHRKMT2A | |
| SCHEMBL18572501 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9709891-B2 | Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2017-07-18 | — | — | US | disclosed |
| US-20150168838-A1 | POSITIVE RESIST COMPOSITION, RESIN USED FOR THE POSITIVE RESIST COMPOSITION, COMPOUND USED FOR SYNTHESIS OF THE RESIN AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2015-06-18 | — | — | US | disclosed |
| US-9057952-B2 | Positive resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2015-06-16 | — | — | US | disclosed |
| EP-1764649-B1 | Positive resist composition and pattern forming method using the same | FUJIFILM CORP (JP) | 2014-11-12 | — | — | EP | disclosed |
| US-8877421-B2 | Positive resist composition and pattern-forming method | FUJIFILM CORPORATION (JP) | 2014-11-04 | — | — | US | disclosed |
| US-8241840-B2 | Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method | FUJIFILM CORPORATION (JP) | 2012-08-14 | — | — | US | disclosed |
| US-20120115085-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH THE SAME | FUJIFILM CORPORATION (JP) | 2012-05-10 | — | — | US | disclosed |
| US-20110250543-A1 | PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2011-10-13 | — | — | US | disclosed |
| US-8017298-B2 | Method of forming patterns | FUJIFILM CORPORATION (JP) | 2011-09-13 | — | — | US | disclosed |
| US-20100330507-A1 | PATTERN FORMING METHOD, RESIST COMPOSITION TO BE USED IN THE PATTERN FORMING METHOD, NEGATIVE DEVELOPING SOLUTION TO BE USED IN THE PATTERN FORMING METHOD AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT TO BE USED IN THE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2010-12-30 | — | — | US | disclosed |
| US-20100068661-A1 | PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2010-03-18 | — | — | US | disclosed |
| US-7674567-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2010-03-09 | — | — | US | disclosed |
| US-7635553-B2 | Pattern forming method and resist composition used therefor | FUJIFILM CORPORATION (JP) | 2009-12-22 | — | — | US | disclosed |
| US-20080318171-A1 | METHOD OF FORMING PATTERNS | FUJIFILM CORPORATION (JP) | 2008-12-25 | — | — | US | disclosed |
| US-20080248420-A1 | POSITIVE RESIST COMPOSITION AND PATTERN-FORMING METHOD | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20070077519-A1 | Pattern forming method and resist composition used therefor | FUJI PHOTO FILM CO., LTD. | 2007-04-05 | — | — | US | disclosed |
| US-20070065752-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-22 | — | — | US | disclosed |
| EP-1764649-A2 | Positive resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2007-03-21 | — | — | EP | disclosed |