Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | EPHX2 | P34913 | 9/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | P2RX7 | Q99572 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16065514 | 0.91 | ALDH1A1 (0.39) | ALDH1A1TSHREPHX2HSD17B10L3MBTL1 | |
| SCHEMBL16519734 | 0.88 | HSD17B10 (0.40) | ALDH1A1TSHREPHX2HSD17B10L3MBTL1 | |
| SCHEMBL9609292 | 0.86 | ALDH1A1 (0.42) | ALDH1A1TSHREPHX2HSD17B10L3MBTL1 | |
| SCHEMBL19042237 | 0.85 | ALDH1A1 (0.41) | ALDH1A1TSHREPHX2HSD17B10CA2 | |
| SCHEMBL19042250 | 0.83 | ALDH1A1 (0.39) | ALDH1A1TSHREPHX2HSD17B10CA2 | |
| SCHEMBL10029321 | 0.82 | ALDH1A1 (0.43) | ALDH1A1TSHREPHX2HSD17B10CA2 | |
| SCHEMBL19042235 | 0.81 | CA2 (0.43) | ALDH1A1TSHREPHX2HSD17B10CA2 | |
| SCHEMBL18572485 | 0.80 | ALDH1A1 (0.37) | ALDH1A1TSHREPHX2HSD17B10CA2 | |
| SCHEMBL12452699 | 0.80 | ALDH1A1 (0.40) | ALDH1A1TSHREPHX2HSD17B10CA2 | |
| SCHEMBL12256395 | 0.79 | ALDH1A1 (0.43) | ALDH1A1TSHREPHX2HSD17B10CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120135348-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2012-05-31 | — | — | US | disclosed |