Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28430358 | 0.92 | ALDH1A1 (0.34) | ALDH1A1GAA | |
| SCHEMBL10617310 | 0.79 | — | — | |
| SCHEMBL961204 | 0.79 | — | — | |
| SCHEMBL399613 | 0.78 | — | — | |
| SCHEMBL3902377 | 0.77 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL3893283 | 0.77 | ALDH1A1 (0.32) | ALDH1A1 | |
| SCHEMBL5405095 | 0.77 | — | — | |
| SCHEMBL3892685 | 0.75 | HTT (0.35) | — | |
| SCHEMBL409239 | 0.74 | — | — | |
| SCHEMBL250819 | 0.74 | TSHR (0.39) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7485690-B2 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-03 | — | — | US | claimed |
| CN-115362228-A | Two-pack type adhesive composition | 日本曹达株式会社 | 2022-11-18 | — | — | CN | disclosed |
| CN-107209303-B | Far infrared ray reflective film, dispersion for forming far infrared ray reflective film, method for producing far infrared ray reflective film, far infrared ray reflective glass, and window | 富士胶片株式会社 | 2020-07-14 | — | — | CN | disclosed |
| US-10589494-B2 | Far infrared reflective film, dispersion for forming far infrared reflective film, manufacturing method of far infrared reflective film, far infrared reflective glass, and window | FUJIFILM CORPORATION (JP) | 2020-03-17 | — | — | US | disclosed |
| US-20180079917-A1 | HEAT INSULATION PAINT | FUJIFILM CORPORATION (JP) | 2018-03-22 | — | — | US | disclosed |
| US-20170320302-A1 | FAR INFRARED REFLECTIVE FILM, DISPERSION FOR FORMING FAR INFRARED REFLECTIVE FILM, MANUFACTURING METHOD OF FAR INFRARED REFLECTIVE FILM, FAR INFRARED REFLECTIVE GLASS, AND WINDOW | FUJIFILM CORPORATION (JP) | 2017-11-09 | — | — | US | disclosed |
| US-20110000658-A1 | HYDROPHILIC MEMBER | FUJIFILM CORPORATION (JP) | 2011-01-06 | — | — | US | disclosed |
| EP-2239137-A1 | HYDROPHILIC MEMBERS | FUJIFILM Corporation (JP) | 2010-10-13 | — | — | EP | disclosed |
| US-7485690-B2 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-03 | — | — | US | disclosed |
| US-7385021-B2 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-06-10 | — | — | US | disclosed |
| US-20050274692-A1 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. | 2005-12-15 | — | — | US | disclosed |
| US-20050277755-A1 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. | 2005-12-15 | — | — | US | disclosed |