SCHEMBL9614296

SCHEMBL9614296

O[Si](O)(O)O.[AlH3].[BaH2].[Zn]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5412779 0.94
SCHEMBL28271535 0.93
SCHEMBL134828 0.93
SCHEMBL790595 0.93
SCHEMBL645392 0.86
SCHEMBL9784973 0.86
SCHEMBL9762470 0.86
SCHEMBL11790595 0.86
SCHEMBL6721208 0.86
SCHEMBL11298856 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0454734-A4 DEVITRIFYING GLASS FORMULATIONS FOR LOW EXPANSION PRINTED-CIRCUIT SUBSTRATES AND INKS 1992-03-11 EP disclosed
EP-0454734-A1 DEVITRIFYING GLASS FORMULATIONS FOR LOW EXPANSION PRINTED-CIRCUIT SUBSTRATES AND INKS DAVID SARNOFF RESEARCH CENTER (US) 1991-11-06 EP disclosed
WO-1990008110-A1 DEVITRIFYING GLASS FORMULATIONS FOR LOW EXPANSION PRINTED-CIRCUIT SUBSTRATES AND INKS DAVID SARNOFF RESEARCH CENTER, INC. (US) 1990-07-26 WO disclosed
US-4863517-A Via fill ink composition for integrated circuits GENERAL ELECTRIC COMPANY (US) 1989-09-05 US disclosed
EP-0304310-A1 Devitrifying glass frits GENERAL ELECTRIC COMPANY (US) 1989-02-22 EP disclosed
EP-0304310-A1 Devitrifying glass frits GENERAL ELECTRIC COMPANY (US) 1989-02-22 EP disclosed
US-4788163-A SUBSTRATES FOR DIRECT MOUNTING OF SILICON CHIPS; DIELECTRICS; THICK FILM VIA-FILL INKS GENERAL ELECTRIC COMPANY (US) 1988-11-29 US disclosed