Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | GLA | P06280 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18270266 | 0.96 | KMT2A (0.33) | KMT2AMEN1 | |
| SCHEMBL12009850 | 0.88 | NPSR1 (0.41) | KMT2AMEN1ALDH1A1HTTNPSR1 | |
| SCHEMBL12920508 | 0.88 | KMT2A (0.35) | KMT2AMEN1ALDH1A1GLAHPGD | |
| SCHEMBL12884352 | 0.85 | THRB (0.35) | KMT2AMEN1ALDH1A1HTTNPC1 | |
| SCHEMBL963171 | 0.85 | KMT2A (0.38) | KMT2AMEN1ALDH1A1HPGDNPC1 | |
| SCHEMBL962818 | 0.85 | KMT2A (0.34) | KMT2AMEN1ALDH1A1GLAHPGD | |
| SCHEMBL12972075 | 0.84 | MEN1 (0.31) | KMT2AMEN1 | |
| SCHEMBL12884354 | 0.84 | TSHR (0.36) | KMT2AALDH1A1HPGD | |
| SCHEMBL18776017 | 0.82 | POLB (0.31) | KMT2AMEN1POLB | |
| SCHEMBL13011183 | 0.81 | MEN1 (0.30) | KMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7871752-B2 | Lactone-containing compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-01-18 | — | — | US | disclosed |
| US-20080026331-A1 | Lactone-containing compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-01-31 | — | — | US | disclosed |