SCHEMBL961850

SCHEMBL961850

CCCC(C)(O)CC(C)=O

nearest known ligand 0.40

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
HMGCR P04035 1/20 0.40
CHRM1 P11229 1/20 0.40
TBXA2R P21731 1/20 0.40
ADRA1A P35348 1/20 0.40
ALDH1A1 P00352 4/20 0.36
TDP1 Q9NUW8 2/20 0.36
FDPS P14324 2/20 0.36
LMNA P02545 2/20 0.34
HSD17B10 Q99714 1/20 0.34
CES2 O00748 1/20 0.31
GAA P10253 1/20 0.30
FFAR1 O14842 1/20 0.30
CPT2 P23786 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28320787 0.82 FDPS (0.44) FDPSCES2
SCHEMBL2784804 0.82 ALDH1A1 (0.45) HMGCRCHRM1TBXA2RADRA1AALDH1A1
SCHEMBL7041938 0.81 HMGCR (0.58) HMGCRCHRM1TBXA2RADRA1AALDH1A1
SCHEMBL2152498 0.80 HMGCR (0.67) HMGCRCHRM1TBXA2RADRA1AALDH1A1
SCHEMBL333179 0.80 HMGCR (0.67) HMGCRCHRM1TBXA2RADRA1AALDH1A1
SCHEMBL1286514 0.80 ALDH1A1 (0.43) HMGCRCHRM1TBXA2RADRA1AALDH1A1
SCHEMBL11597915 0.80 HMGCR (0.40) HMGCRCHRM1TBXA2RADRA1AALDH1A1
SCHEMBL2153315 0.80 HMGCR (0.67) HMGCRCHRM1TBXA2RADRA1AALDH1A1
SCHEMBL14644733 0.79
SCHEMBL3903716 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 135 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1948672-B1 CATALYSTS FOR CATALYTIC CHAIN TRANSFER DU PONT (US) 2011-05-11 EP claimed
US-11988809-B2 Laminate, antireflection product, and manufacturing method thereof FUJIFILM CORPORATION (JP) 2024-05-21 US disclosed
US-20220075095-A1 LAMINATE, ANTIREFLECTION PRODUCT, AND MANUFACTURING METHOD THEREOF FUJIFILM CORPORATION (JP) 2022-03-10 US disclosed
US-11209575-B2 Laminate, antireflection product, and manufacturing method thereof FUJIFILM CORPORATION (JP) 2021-12-28 US disclosed
US-10454411-B2 Light-condensing film, solar cell module, and transfer mold DAIKIN INDUSTRIES, LTD. (JP) 2019-10-22 US disclosed
US-10392699-B2 Method for manufacturing structure having recessed pattern, resin composition, method for forming electroconductive film, electronic circuit, and electronic device JSR CORPORATION (JP) 2019-08-27 US disclosed
US-20190162878-A1 LAMINATE, ANTIREFLECTION PRODUCT, AND MANUFACTURING METHOD THEREOF FUJIFILM CORPORATION (JP) 2019-05-30 US disclosed
US-10082605-B2 Manufacturing method of antireflection article, antireflection article, cover glass, and image display device FUJIFILM CORPORATION (JP) 2018-09-25 US disclosed
US-20170306481-A1 METHOD FOR MANUFACTURING STRUCTURE HAVING RECESSED PATTERN, RESIN COMPOSITION, METHOD FOR FORMING ELECTROCONDUCTIVE FILM, ELECTRONIC CIRCUIT, AND ELECTRONIC DEVICE JSR CORPORATION (JP) 2017-10-26 US disclosed
US-9633755-B2 Conductive composition, conductive member, conductive member production method, touch panel, and solar cell FUJIFILM CORPORATION (JP) 2017-04-25 US disclosed
US-6048617-A RESIN COATED WITH COMPOSITION CONTAINING ACRYLIC POLYMER CONTAINING NO HYDROXYL GRPOUP, A COMPLEX HAVING OXYGEN LIGANDS, SILANOL OR PRECURSOR, AND UV ABSORBER; COATINGFOR AUTOMOBILE HEAD LAMPS ORIGIN ELECTRIC COMPANY, LIMITED (JP) 2000-04-11 US disclosed
CN-1196746-A Pollutant deposition inhibitor and coating material composition DAIKIN IND LTD (JP) 1998-10-21 CN disclosed
EP-0852251-A1 POLLUTANT DEPOSITION INHIBITOR AND COATING MATERIAL COMPOSITION DAIKIN INDUSTRIES, LIMITED (JP) 1998-07-08 EP disclosed
EP-0779327-A1 SURFACE-COATED MOLDED PLASTIC ARTICLES HAVING GOOD DURABILITY ORIGIN ELECTRIC CO. LTD. (JP) 1997-06-18 EP disclosed
EP-0185526-B1 SOLVENT SOLUBLE FLUORINE-CONTAINING POLYMER, COATING COMPOSITION CONTAINING THE SAME AND COATING PROCESS THEREOF MITSUI SEKIYU KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1991-03-13 EP disclosed
US-4945022-A Triboelectric charge application member for toner comprising copolymer of fluoro-olefin monomer and unsaturated silicon monomer RICOH COMPANY, LTD. (JP) 1990-07-31 US disclosed
US-4841331-A SUBSTRATE COATED WITH COPOLYMER OF FLUOROOLEFIN AND UNSATURATED SILICON COMPOUND; STABILITY RICOH COMPANY, LTD. (JP) 1989-06-20 US disclosed
US-4751114-A COPOLYMER OF FLUOROLEFIN, VINYL ETHER AND ORGANOSILICON COMPOUND MITSUI SEKIYU KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1988-06-14 US disclosed
EP-0185526-A2 Solvent soluble fluorine-containing polymer, coating composition containing the same and coating process thereof MITSUI SEKIYU KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1986-06-25 EP disclosed
US-4508779-A POLYESTERIMIDE COATINGS SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) 1985-04-02 US disclosed