SCHEMBL962606

SCHEMBL962606

C=CN(CCC[Si](OCC)(OCC)OCC)Cc1ccccc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.35
ALDH1A1 P00352 4/20 0.35
NPSR1 Q6W5P4 1/20 0.35
TSHR P16473 3/20 0.33
SIGMAR1 Q99720 1/20 0.32
ACKR3 P25106 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
MAOB P27338 1/20 0.32
NPC1 O15118 1/20 0.32
LMNA P02545 1/20 0.32
ALOX15 P16050 1/20 0.32
MAPK1 P28482 1/20 0.32
HSD17B10 Q99714 1/20 0.32
CARM1 Q86X55 1/20 0.31
PRMT6 Q96LA8 1/20 0.31
PRMT8 Q9NR22 1/20 0.31
CHRM2 P08172 1/20 0.31
HTR1A P08908 1/20 0.31
ADRA2A P08913 1/20 0.31
CHRM1 P11229 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL963172 0.88 GAA (0.35) GAAALDH1A1NPSR1TSHRSIGMAR1
SCHEMBL5171733 0.87 KCNH2 (0.37) GAAALDH1A1NPSR1SIGMAR1KCNH2
SCHEMBL7771757 0.87 ALDH1A1 (0.40) GAAALDH1A1NPSR1TSHRSIGMAR1
Hydrochloric Acid SCHEMBL2678846 0.86 KCNH2 (0.36) GAAALDH1A1NPSR1SIGMAR1KCNH2
SCHEMBL24727378 0.81 BCHE (0.43) TSHRMAOBMAPK1CHRM2HTR1A
SCHEMBL4425512 0.81 BCHE (0.45) TSHRMAOBMAPK1CHRM2HTR1A
SCHEMBL21049526 0.80 SIGMAR1 (0.53) TSHRSIGMAR1ACKR3MAOBLMNA
SCHEMBL28253828 0.79 CARM1 (0.32) CARM1PRMT6PRMT8
SCHEMBL28695975 0.79 ALDH1A1 (0.40) GAAALDH1A1NPSR1TSHRL3MBTL1
SCHEMBL855604 0.79 KCNH2 (0.44) GAAALDH1A1NPSR1TSHRSIGMAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023072128-A1 COLORANT COMPOSITION AND COATED ARTICLE GUANGDONG HUARUN PAINTS CO., LTD. (CN) 2023-05-04 WO claimed
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
WO-2023072128-A1 COLORANT COMPOSITION AND COATED ARTICLE GUANGDONG HUARUN PAINTS CO., LTD. (CN) 2023-05-04 WO disclosed
CN-107209303-B Far infrared ray reflective film, dispersion for forming far infrared ray reflective film, method for producing far infrared ray reflective film, far infrared ray reflective glass, and window 富士胶片株式会社 2020-07-14 CN disclosed
US-10589494-B2 Far infrared reflective film, dispersion for forming far infrared reflective film, manufacturing method of far infrared reflective film, far infrared reflective glass, and window FUJIFILM CORPORATION (JP) 2020-03-17 US disclosed
CN-105829485-B Photocurable composition with adhesiveness 思美定株式会社 2018-10-12 CN disclosed
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP disclosed
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP disclosed
US-20180079917-A1 HEAT INSULATION PAINT FUJIFILM CORPORATION (JP) 2018-03-22 US disclosed
US-20170320302-A1 FAR INFRARED REFLECTIVE FILM, DISPERSION FOR FORMING FAR INFRARED REFLECTIVE FILM, MANUFACTURING METHOD OF FAR INFRARED REFLECTIVE FILM, FAR INFRARED REFLECTIVE GLASS, AND WINDOW FUJIFILM CORPORATION (JP) 2017-11-09 US disclosed
US-20050124747-A1 Coating composition for ink-jet recording medium and ink-jet recording medium DEUTSCHE BANK AG, NEW YORK BRANCH, AS COLLATERAL AGENT 2005-06-09 US disclosed
US-20050116401-A1 Method of producing tortional damper NOK CORPORATION (JP) 2005-06-02 US disclosed
EP-1470928-A1 COATING COMPOSITION FOR INK-JET RECORDING MEDIUM AND INK-JET RECORDING MEDIUM Clariant International Ltd. (CH) 2004-10-27 EP disclosed
EP-1114734-A1 RESIN COMPOSITION FOR INK-JET RECORDING SHEET AND RECORDING SHEET MADE WITH THE SAME DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) 2001-07-11 EP disclosed
EP-0989162-A1 THERMOPLASTIC RESIN COMPOSITION, WATER-BASED COMPOSITION, HEAT-SENSITIVE PRESSURE-SENSITIVE ADHESIVE, AND HEAT-SENSITIVE SHEET Daicel Chemical Industries, Ltd. (JP) 2000-03-29 EP disclosed
EP-0989168-A1 Water-based coating composition Daicel Chemical Industries, Ltd. (JP) 2000-03-29 EP disclosed
US-5064876-A Silane or p olysiloxone with a liphatic unsaturation or amino group TORAY SILICONE COMPANY, LTD. (JP) 1991-11-12 US disclosed
US-5059669-A Radiation curable polysiloxane having acrylated amino groups TORAY SILICONE COMPANY, LTD. (JP) 1991-10-22 US disclosed
EP-0272809-A2 Adhesion promoter Toray Silicone Co., Ltd. (JP) 1988-06-29 EP disclosed