SCHEMBL9626488

SCHEMBL9626488

CCCc1ccccc1C(=O)c1ccccc1CCC

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FOLH1 Q04609 1/20 0.47
ALDH1A1 P00352 4/20 0.44
LMNA P02545 1/20 0.44
TP53 P04637 3/20 0.44
CNR2 P34972 2/20 0.43
KDR P35968 1/20 0.43
HCRTR1 O43613 3/20 0.43
HCRTR2 O43614 3/20 0.43
HTT P42858 2/20 0.42
TSHR P16473 5/20 0.42
GAA P10253 1/20 0.42
MAPT P10636 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
TDP1 Q9NUW8 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
KMT2A Q03164 1/20 0.41
CYP3A4 P08684 1/20 0.40
MAPK1 P28482 1/20 0.40
CLCN2 P51788 1/20 0.40
ADRB2 P07550 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10664651 0.91 FOLH1 (0.53) FOLH1ALDH1A1LMNAHTTGAA
SCHEMBL19834620 0.89 FOLH1 (0.40) FOLH1ALDH1A1LMNATP53CNR2
SCHEMBL7252078 0.88 AKR1C3 (0.52) FOLH1ALDH1A1GAAMAPTL3MBTL1
SCHEMBL1404026 0.88 TSHR (0.47) FOLH1ALDH1A1LMNATP53CNR2
SCHEMBL617126 0.86 LIPG (0.55) ALDH1A1LMNATP53HTTTSHR
SCHEMBL30628269 0.85 ALDH1A1 (0.47) FOLH1ALDH1A1LMNATP53KDR
SCHEMBL2125820 0.85 ALDH1A1 (0.47) FOLH1ALDH1A1LMNATP53KDR
SCHEMBL241263 0.85 FOLH1 (0.66) FOLH1ALDH1A1HTTTSHRSMN1; SMN2
SCHEMBL5690419 0.85 ALDH1A1 (0.47) FOLH1ALDH1A1LMNATP53KDR
SCHEMBL29424595 0.85 FOLH1 (0.66) FOLH1ALDH1A1HTTTSHRSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110891562-B Lithium salts of N-substituted glycine compounds and uses thereof 心悦生医股份有限公司 2024-07-16 CN claimed
CN-113549175-B Multifunctional conductive ionic liquid gel and preparation method and application thereof 华南理工大学 2022-04-22 CN claimed
CN-113549175-A Multifunctional conductive ionic liquid gel and preparation method and application thereof 华南理工大学 2021-10-26 CN claimed
CN-113347965-B TGF-beta inhibitors and prodrugs 生物医学研究机构基金会 2025-02-18 CN disclosed
CN-110891562-B Lithium salts of N-substituted glycine compounds and uses thereof 心悦生医股份有限公司 2024-07-16 CN disclosed
CN-118001260-A Dissolving monosodium urate for treating gout 贺亮 2024-05-10 CN disclosed
CN-111479806-B D-amino acid oxidase inhibitors and therapeutic uses thereof 心悦生医股份有限公司 2024-01-30 CN disclosed
CN-111491625-B Dissolving monosodium urate for treating gout 贺亮 2023-12-01 CN disclosed
CN-110944644-B Anti-inflammatory compositions comprising novel quercetin compounds 株式会社爱茉莉太平洋 2023-06-13 CN disclosed
CN-110769833-B Anti-inflammatory composition comprising kaempferol compounds derived from post-fermented tea 株式会社爱茉莉太平洋 2023-05-12 CN disclosed
CN-113549175-B Multifunctional conductive ionic liquid gel and preparation method and application thereof 华南理工大学 2022-04-22 CN disclosed
CN-111225946-A Thermal interface compositions comprising ionically modified siloxanes 莫门蒂夫性能材料股份有限公司 2020-06-02 CN disclosed
EP-0234570-B1 PHOTOPOLYMERIZABLE COMPOSITION, PHOTOSENSITIVE ELEMENT WITH THAT COMPOSITION, AND PROCESS FOR THE PRODUCTION OF A LITHOGRAPHIC PRINTING PLATE USING THIS ELEMENT BASF Aktiengesellschaft (DE) 1992-04-22 EP disclosed
EP-0032062-B2 HIGH-MOLECULAR-WEIGHT NOVOLAK SUBSTITUTED PHENOLIC RESINS AND THEIR PREPARATION MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1991-10-16 EP disclosed
US-4935330-A Photopolymerizable mixture, photosensitive recording element containing this mixture, and the production of lithographic printing plate using this photosensitive recording element BASF AKTIENGESELLSCHAFT (DE) 1990-06-19 US disclosed
EP-0234570-A2 Photopolymerizable composition, photosensitive element with that composition, and process for the production of a lithographic printing plate using this element BASF Aktiengesellschaft (DE) 1987-09-02 EP disclosed
EP-0032062-B1 HIGH-MOLECULAR-WEIGHT NOVOLAK SUBSTITUTED PHENOLIC RESINS AND THEIR PREPARATION MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1985-04-03 EP disclosed
US-4347383-A BY REACTING BENZOPHENONE-IMINE WITH OXYGEN OR BENZOPHENONE WITH OXYGEN AND AMMONIA MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1982-08-31 US disclosed
EP-0032062-A2 High-molecular-weight novolak substituted phenolic resins and their preparation MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1981-07-15 EP disclosed
US-4042587-A PESTICIDES BASF AKTIENGESELLSCHAFT (DT) 1977-08-16 US disclosed