SCHEMBL9636277

SCHEMBL9636277

O=S(=O)(CBr)c1nc2ccccc2s1

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.65
MAPT P10636 5/20 0.65
HTT P42858 5/20 0.65
LMNA P02545 4/20 0.65
KMT2A Q03164 4/20 0.65
MEN1 O00255 1/20 0.65
L3MBTL1 Q9Y468 1/20 0.65
PSMB8 P28062 1/20 0.64
PSMB5 P28074 1/20 0.64
CA12 O43570 1/20 0.62
CA1 P00915 1/20 0.62
CA2 P00918 1/20 0.62
CA4 P22748 1/20 0.62
CA7 P43166 1/20 0.62
CA14 Q9ULX7 1/20 0.62
SMN1; SMN2 Q16637 5/20 0.58
TP53 P04637 1/20 0.51
NPC1 O15118 2/20 0.50
RAB9A P51151 2/20 0.50
AKR1B1 P15121 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3595617 0.84 ALDH1A1 (0.67) ALDH1A1MAPTHTTLMNAKMT2A
SCHEMBL30149949 0.84 ALDH1A1 (0.67) ALDH1A1MAPTHTTLMNAKMT2A
SCHEMBL7646253 0.83 ALDH1A1 (0.65) ALDH1A1MAPTHTTLMNAKMT2A
SCHEMBL28000437 0.83 PSMB8 (0.69) ALDH1A1MAPTHTTLMNAKMT2A
SCHEMBL30732411 0.83 PSMB8 (0.69) ALDH1A1MAPTHTTLMNAKMT2A
SCHEMBL7905772 0.83 ALDH1A1 (0.65) ALDH1A1MAPTHTTLMNAKMT2A
SCHEMBL9393802 0.80 PSMB8 (0.65) ALDH1A1MAPTHTTLMNAKMT2A
SCHEMBL2711265 0.80 PSMB8 (0.75) ALDH1A1MAPTHTTLMNAKMT2A
SCHEMBL6029431 0.79 ALDH1A1 (1.00) ALDH1A1MAPTHTTLMNAKMT2A
SCHEMBL21827067 0.79 ALDH1A1 (0.60) ALDH1A1MAPTHTTLMNAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0256820-B1 THERMAL DEVELOPING LIGHT-SENSITIVE MATERIAL KONICA CORPORATION (JP) 1992-07-29 EP disclosed
US-5032499-A High density, stability KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1991-07-16 US disclosed
EP-0256820-A2 Thermal developing light-sensitive material KONICA CORPORATION (JP) 1988-02-24 EP disclosed