SCHEMBL9636685

SCHEMBL9636685

CCCCNC([SiH3])NCCCC

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.41
ALDH1A1 P00352 2/20 0.36
CA1 P00915 2/20 0.36
CA2 P00918 2/20 0.36
ADH1B P00325 1/20 0.36
ADH1C P00326 1/20 0.36
ADH1A P07327 1/20 0.36
ADH7 P40394 1/20 0.36
CA12 O43570 1/20 0.36
CA7 P43166 1/20 0.36
CA14 Q9ULX7 1/20 0.36
POLB P06746 1/20 0.34
MAPT P10636 1/20 0.34
EPHX1 P07099 3/20 0.33
LMNA P02545 1/20 0.33
ALOX15 P16050 1/20 0.32
THRB P10828 1/20 0.32
SLC2A1 P11166 1/20 0.31
ACHE P22303 1/20 0.30
MMP2 P08253 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27032909 0.81 SIGMAR1 (0.33) CA1ADH1BADH1AADH7
SCHEMBL27131291 0.80
SCHEMBL27511066 0.77
SCHEMBL236462 0.75 TSHR (0.53) TSHRALDH1A1CA1CA2ADH1B
SCHEMBL23448473 0.73 TSHR (0.43) TSHRALDH1A1CA1CA2ADH1B
SCHEMBL8940018 0.73
SCHEMBL269744 0.73
SCHEMBL27033022 0.72 TSHR (0.38) TSHRALDH1A1CA1CA2ADH1B
SCHEMBL6972158 0.71
SCHEMBL5367349 0.71 LMNA (0.48) TSHRALDH1A1CA1CA2ADH1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116918029-A selective thermal atomic layer deposition 弗萨姆材料美国有限责任公司 2023-10-20 CN claimed
CN-116761906-A Selective plasma enhanced atomic layer deposition 弗萨姆材料美国有限责任公司 2023-09-15 CN claimed
US-20240030026-A1 PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PROCESSING APPARATUS, AND RECORDING MEDIUM Kokusai Electric Corporation (JP) 2024-01-25 US disclosed
WO-2022264430-A1 SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING DEVICE, AND PROGRAM 株式会社KOKUSAI ELECTRIC 2022-12-22 WO disclosed
EP-0292138-B1 SILYLAMINES AS ADDITIVES IN GROUP TRANSFER POLYMERIZATION E.I. DU PONT DE NEMOURS AND COMPANY (US) 1992-06-17 EP disclosed
EP-0292138-A1 Silylamines as additives in group transfer polymerization E.I. DU PONT DE NEMOURS AND COMPANY (US) 1988-11-23 EP disclosed