SCHEMBL963719

SCHEMBL963719

CO[Si](C)(CCCOC(C)=O)OC

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.50
TSHR P16473 3/20 0.39
CHRM5 P08912 2/20 0.39
CHRM1 P11229 2/20 0.39
CHRM3 P20309 2/20 0.39
PGR P06401 1/20 0.39
CHRM2 P08172 1/20 0.39
CHRM4 P08173 1/20 0.39
HTR1A P08908 1/20 0.39
CHRNB2 P17787 1/20 0.39
TBXA2R P21731 1/20 0.39
CHRNB4 P30926 1/20 0.39
CHRNA3 P32297 1/20 0.39
CHRNA7 P36544 1/20 0.39
CHRNA4 P43681 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
CHRNA10 Q9GZZ6 1/20 0.39
CHRNA9 Q9UGM1 1/20 0.39
GALR3 O60755 2/20 0.38
GAA P10253 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19958570 0.92 ALDH1A1 (0.47) ALDH1A1TSHRCHRM5CHRM1CHRM3
Ether SCHEMBL20514662 0.91 TSHR (0.50) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL1473802 0.87 ALDH1A1 (0.43) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL4865024 0.86 ALDH1A1 (0.41) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL3341112 0.83 ALDH1A1 (0.50) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL35128 0.82 TSHR (0.55) ALDH1A1TSHRHTT
SCHEMBL2700446 0.82 CHRM2 (0.41) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL20769204 0.82 ADRA2A (0.42) TSHRCYP1A2
SCHEMBL16756242 0.82 ALDH1A1 (0.48) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL13303715 0.81 MGAM (0.43) ALDH1A1TSHRGAAMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4649356-A1 UNDERLAYER AND METHODS FOR EUV LITHOGRAPHY Brewer Science, Inc. (US) 2025-11-19 EP claimed
WO-2024173437-A1 UNDERLAYER AND METHODS FOR EUV LITHOGRAPHY BREWER SCIENCE, INC. (US) 2024-08-22 WO claimed
US-20240280905-A1 UNDERLAYER AND METHODS FOR EUV LITHOGRAPHY BREWER SCIENCE, INC. 2024-08-22 US claimed
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
EP-4649356-A1 UNDERLAYER AND METHODS FOR EUV LITHOGRAPHY Brewer Science, Inc. (US) 2025-11-19 EP disclosed
WO-2024173437-A1 UNDERLAYER AND METHODS FOR EUV LITHOGRAPHY BREWER SCIENCE, INC. (US) 2024-08-22 WO disclosed
US-20240280905-A1 UNDERLAYER AND METHODS FOR EUV LITHOGRAPHY BREWER SCIENCE, INC. 2024-08-22 US disclosed
WO-2024127135-A2 METHODS FOR SILANIZATION OF SUBSTRATES MEDTRONIC, INC. (US) 2024-06-20 WO disclosed
CN-116121469-B Environment-friendly water-washing-resistant two-layer anti-napping skin manufacturing process for cattle 峰安皮业股份有限公司 2024-01-09 CN disclosed
CN-116004930-B Manufacturing process of environment-friendly wear-resistant PU (polyurethane) cattle two-layer leather 峰安皮业股份有限公司 2024-01-05 CN disclosed
CN-116121469-A Environment-friendly water-washing-resistant two-layer anti-napping skin manufacturing process for cattle 峰安皮业股份有限公司 2023-05-16 CN disclosed
WO-2013066911-A1 HYDROPHILIC ORGANOSILANES DOW CORNING CORPORATION (US) 2013-05-10 WO disclosed
US-20110000658-A1 HYDROPHILIC MEMBER FUJIFILM CORPORATION (JP) 2011-01-06 US disclosed
EP-2239137-A1 HYDROPHILIC MEMBERS FUJIFILM Corporation (JP) 2010-10-13 EP disclosed
US-20100151384-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2010-06-17 US disclosed
US-20090050020-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2009-02-26 US disclosed
EP-1855159-A1 COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME JSR Corporation (JP) 2007-11-14 EP disclosed
WO-2005103061-A1 METHOD OF MANUFACTURING AN ORGANOALKOXYSILANE HAVING ESTER-FUNCTIONAL GROUPS DOW CORNING TORAY CO., LTD. (JP) 2005-11-03 WO disclosed
US-5679821-A Process for preparing organosilicon compound TOAGOSEI CO., LTD. (JP) 1997-10-21 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240280905-A1 UNDERLAYER AND METHODS FOR EUV LITHOGRAPHY ETV6, EPHA4, EPHA6 ALDH1A1 4678/4885TSHR 4851/4885CHRM5 809/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.