Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PLA2G4B | P0C869 | 3/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | MLYCD | O95822 | 3/20 | 0.39 |
| ▸ | RARB | P10826 | 4/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | MMP1 | P03956 | 1/20 | 0.37 |
| ▸ | PLA2G4A | P47712 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL963741 | 1.00 | PLA2G4B (0.42) | PLA2G4BTP53TSHRMLYCDRARB | |
| SCHEMBL29645014 | 0.94 | PLA2G4B (0.40) | PLA2G4BTP53TSHRMLYCDRARB | |
| SCHEMBL546992 | 0.94 | PLA2G4B (0.44) | PLA2G4BTP53TSHRRARBGAA | |
| SCHEMBL546993 | 0.94 | PLA2G4B (0.44) | PLA2G4BTP53TSHRRARBGAA | |
| SCHEMBL2610386 | 0.94 | PLA2G4B (0.44) | PLA2G4BTP53TSHRRARBGAA | |
| SCHEMBL3215754 | 0.92 | PLA2G4B (0.42) | PLA2G4BTP53TSHRRARBGAA | |
| SCHEMBL2610387 | 0.90 | PLA2G4B (0.48) | PLA2G4BTP53TSHRRARBGAA | |
| SCHEMBL2607824 | 0.89 | PLA2G4B (0.40) | PLA2G4BTP53TSHRRARBGAA | |
| SCHEMBL2757709 | 0.89 | PLA2G4B (0.40) | PLA2G4BTP53TSHRRARBGAA | |
| SCHEMBL546645 | 0.88 | PLA2G4B (0.42) | PLA2G4BTP53TSHRRARBGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115885217-A | Negative resist film laminate and pattern forming method | 信越化学工业株式会社 | 2023-03-31 | — | — | CN | disclosed |
| CN-114600045-A | Photosensitive resin composition, photosensitive dry film and pattern forming method | 信越化学工业株式会社 | 2022-06-07 | — | — | CN | disclosed |
| EP-2081083-B1 | Positive resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-09-21 | — | — | EP | disclosed |
| EP-2090598-B1 | Polymer, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-06-29 | — | — | EP | disclosed |
| US-7871752-B2 | Lactone-containing compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-01-18 | — | — | US | disclosed |
| US-20080026331-A1 | Lactone-containing compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-01-31 | — | — | US | disclosed |