Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PLA2G4B | P0C869 | 2/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | MLYCD | O95822 | 5/20 | 0.38 |
| ▸ | CA12 | O43570 | 2/20 | 0.37 |
| ▸ | CA1 | P00915 | 2/20 | 0.37 |
| ▸ | CA2 | P00918 | 2/20 | 0.37 |
| ▸ | CA9 | Q16790 | 2/20 | 0.37 |
| ▸ | RARB | P10826 | 3/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL963742 | 0.94 | PLA2G4B (0.42) | PLA2G4BL3MBTL1TP53TSHRMLYCD | |
| SCHEMBL963741 | 0.94 | PLA2G4B (0.42) | PLA2G4BL3MBTL1TP53TSHRMLYCD | |
| SCHEMBL178355 | 0.94 | PLA2G4B (0.42) | PLA2G4BL3MBTL1TP53TSHRCA12 | |
| SCHEMBL546644 | 0.94 | PLA2G4B (0.42) | PLA2G4BL3MBTL1TP53TSHRCA12 | |
| SCHEMBL546645 | 0.94 | PLA2G4B (0.42) | PLA2G4BL3MBTL1TP53TSHRCA12 | |
| SCHEMBL14947458 | 0.94 | PLA2G4B (0.42) | PLA2G4BL3MBTL1TP53TSHRCA12 | |
| SCHEMBL3215754 | 0.91 | PLA2G4B (0.42) | PLA2G4BL3MBTL1TP53TSHRCA12 | |
| SCHEMBL14556415 | 0.91 | L3MBTL1 (0.45) | PLA2G4BL3MBTL1TP53TSHRCA12 | |
| SCHEMBL106335 | 0.90 | PLA2G4B (0.39) | PLA2G4BL3MBTL1TP53TSHRCA12 | |
| SCHEMBL12320630 | 0.90 | GAA (0.42) | PLA2G4BL3MBTL1TP53TSHRCA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115885217-A | Negative resist film laminate and pattern forming method | 信越化学工业株式会社 | 2023-03-31 | — | — | CN | disclosed |
| CN-114600045-A | Photosensitive resin composition, photosensitive dry film and pattern forming method | 信越化学工业株式会社 | 2022-06-07 | — | — | CN | disclosed |