SCHEMBL9640577

SCHEMBL9640577

CCC(O)N(CC)c1ccc(C(=O)c2ccc(N(CC)C(O)CC)cc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 5/20 0.47
ALDH1A1 P00352 4/20 0.47
MAPT P10636 4/20 0.47
RAB9A P51151 2/20 0.42
NPC1 O15118 1/20 0.42
ESRRG P62508 1/20 0.40
LMNA P02545 3/20 0.38
MEN1 O00255 4/20 0.37
KMT2A Q03164 4/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
SMN1; SMN2 Q16637 2/20 0.37
BDKRB2 P30411 1/20 0.35
POLB P06746 1/20 0.35
GAA P10253 1/20 0.35
MCL1 Q07820 1/20 0.35
NOX1 Q9Y5S8 1/20 0.35
SRD5A2 P31213 2/20 0.34
ESR1 P03372 1/20 0.34
ESR2 Q92731 1/20 0.34
PKM P14618 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9626013 0.84 HPGD (0.48) HPGDALDH1A1MAPTRAB9ANPC1
SCHEMBL9640944 0.80 ALDH1A1 (0.53) HPGDALDH1A1MAPTRAB9ANPC1
SCHEMBL11308081 0.77 TSHR (0.44) ALDH1A1MAPTLMNAMEN1KMT2A
SCHEMBL9640975 0.74 ALDH1A1 (0.46) HPGDALDH1A1MAPTRAB9ANPC1
SCHEMBL61950 0.72 ALDH1A1 (0.58) HPGDALDH1A1MAPTRAB9ANPC1
SCHEMBL11128030 0.71 ABCB1 (0.46) HPGDALDH1A1MAPTRAB9AMEN1
SCHEMBL6569210 0.71 MAPT (0.56) HPGDALDH1A1MAPTRAB9ANPC1
Hydrogen Sulfide SCHEMBL6567203 0.71 MAPT (0.56) HPGDALDH1A1MAPTRAB9ANPC1
SCHEMBL14830543 0.71 HPGD (0.56) HPGDALDH1A1MAPTRAB9ANPC1
SCHEMBL82487 0.71 HPGD (0.61) HPGDALDH1A1MAPTRAB9ANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0331007-B1 LIGHT-SENSITIVE RECORDING MATERIALS FOR THE MANUFACTURE OF SCRATCH-RESISTANT INTAGLIO PRINTING FORMES BASF Aktiengesellschaft (DE) 1992-09-02 EP disclosed
US-4994348-A Light-sensitive recording materials for producing mar-resistant intaglio printing plates BASF AKTIENGESELLSCHAFT (DE) 1991-02-19 US disclosed
EP-0331007-A2 Light-sensitive recording materials for the manufacture of scratch-resistant intaglio printing formes BASF Aktiengesellschaft (DE) 1989-09-06 EP disclosed
US-4550072-A Photosensitive recording materials containing particles for the production of abrasion-resistant gravure printing plates, and the production of gravure printing plates using these recording materials BASF AKTIENGESELLSCHAFT (DE) 1985-10-29 US disclosed
US-4548894-A Photosensitive recording materials for the production of abrasion-resistant and scratch-resistant gravure printing plates comprising particles BASF AKTIENGESELLSCHAFT (DE) 1985-10-22 US disclosed
EP-0070511-A1 Photosensible recording materials for the production of intaglio printing forms resistant to abrasion and being scratchproof, and method of producing intaglio printing forms utilizing these recording materials BASF Aktiengesellschaft (DE) 1983-01-26 EP disclosed