Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.83 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.83 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.83 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.75 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.75 |
| ▸ | TP53 | P04637 | 1/20 | 0.75 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.73 |
| ▸ | LMNA | P02545 | 1/20 | 0.73 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.67 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.59 |
| ▸ | POLB | P06746 | 1/20 | 0.59 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.51 |
| ▸ | CA2 | P00918 | 1/20 | 0.51 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.51 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzene SCHEMBL3679548 | 0.98 | TSHR (0.86) | TSHRTDP1L3MBTL1CYP3A4MAPK1 | |
| SCHEMBL29649180 | 0.98 | TSHR (0.86) | TSHRTDP1L3MBTL1CYP3A4MAPK1 | |
| Phthalic Acid SCHEMBL27849166 | 0.98 | TSHR (0.86) | TSHRTDP1L3MBTL1CYP3A4MAPK1 | |
| SCHEMBL151027 | 0.98 | TSHR (0.86) | TSHRTDP1L3MBTL1CYP3A4MAPK1 | |
| Dibutyl Phthalate SCHEMBL2220638 | 0.98 | TSHR (0.86) | TSHRTDP1L3MBTL1CYP3A4MAPK1 | |
| Dibutyl Phthalate SCHEMBL27849163 | 0.98 | TSHR (0.86) | TSHRTDP1L3MBTL1CYP3A4MAPK1 | |
| SCHEMBL27708612 | 0.97 | TSHR (0.83) | TSHRTDP1L3MBTL1CYP3A4MAPK1 | |
| SCHEMBL28435163 | 0.97 | TSHR (0.83) | TSHRTDP1L3MBTL1CYP3A4MAPK1 | |
| SCHEMBL28271712 | 0.97 | TSHR (0.83) | TSHRTDP1L3MBTL1CYP3A4MAPK1 | |
| SCHEMBL11206095 | 0.97 | TSHR (0.83) | TSHRTDP1L3MBTL1CYP3A4MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7867676-B2 | Copper containing hole blocking layer photoconductors | XEROX CORPORATION (US) | 2011-01-11 | — | — | US | claimed |
| US-20090035675-A1 | COPPER CONTAINING HOLE BLOCKING LAYER PHOTOCONDUCTORS | XEROX CORPORATION (US) | 2009-02-05 | — | — | US | claimed |
| US-20250263639-A1 | Cleaning Solution, Method For Cleaning Substrate, And Method For Forming Metal Containing Film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-08-21 | — | — | US | disclosed |
| CN-119384154-A | Composite material, preparation method thereof and light-emitting device | 广东聚华新型显示研究院 | 2025-01-28 | — | — | CN | disclosed |
| CN-117164875-A | Preparation method of tubular metal copper phthalocyanine polymer and cyclic carbonate | 浙江理工大学 | 2023-12-05 | — | — | CN | disclosed |
| US-20230333469-A1 | FILM FORMING COMPOSITION FOR LITHOGRAPHY, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-10-19 | — | — | US | disclosed |
| CN-116710500-A | Polymer, composition, method for producing polymer, composition for forming film, resist composition, method for forming resist pattern, radiation-sensitive composition, composition for forming underlayer film for lithography, method for producing underlayer film for lithography, method for forming circuit pattern, and composition for forming optical member | 三菱瓦斯化学株式会社 | 2023-09-05 | — | — | CN | disclosed |
| CN-116194502-A | Polymer, composition, method for producing polymer, composition, film-forming composition, resist composition, radiation-sensitive composition, underlayer film-forming composition for lithography, resist pattern-forming method, method for producing underlayer film for lithography, circuit pattern-forming method, and composition for forming optical member | 三菱瓦斯化学株式会社 | 2023-05-30 | — | — | CN | disclosed |
| CN-115836045-A | Composition for forming photoresist, method for forming resist pattern, and method for forming circuit pattern | 三菱瓦斯化学株式会社 | 2023-03-21 | — | — | CN | disclosed |
| WO-2022158335-A1 | POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, FILM-FORMING COMPOSITION, RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, METHOD FOR FORMING CIRCUIT PATTERN, AND COMPOSITION FOR FORMING OPTICAL MEMBER | 三菱瓦斯化学株式会社 | 2022-07-28 | — | — | WO | disclosed |
| CN-113429429-A | Production method of benzimidazole-2-methyl carbamate-8-hydroxyquinoline copper | 苏州华道生物药业股份有限公司 | 2021-09-24 | — | — | CN | disclosed |
| CN-113302223-A | Film-forming composition, resist composition, radiation-sensitive composition, method for producing amorphous film, method for forming resist pattern, composition for forming underlayer film for lithography, method for producing underlayer film for lithography, and method for forming circuit pattern | 三菱瓦斯化学株式会社 | 2021-08-24 | — | — | CN | disclosed |
| CN-113286841-A | Polycyclic polyphenol resin and method for producing polycyclic polyphenol resin | 三菱瓦斯化学株式会社 | 2021-08-20 | — | — | CN | disclosed |
| CN-105623500-B | The weatherability coating composition of normal temperature cure | 关西涂料株式会社 | 2019-10-11 | — | — | CN | disclosed |
| CN-106461831-B | Near infrared ray absorbing composition, near infrared ray cut-off filter and its manufacturing method, solid-state imager, camera module | 富士胶片株式会社 | 2019-04-09 | — | — | CN | disclosed |
| US-9011890-B2 | Antibacterial sol-gel coating solution | QINHUANGDAO YIPENG SPECIAL GLASS CO., LTD. (CN) | 2015-04-21 | — | — | US | disclosed |
| US-7867676-B2 | Copper containing hole blocking layer photoconductors | XEROX CORPORATION (US) | 2011-01-11 | — | — | US | disclosed |
| US-20090035675-A1 | COPPER CONTAINING HOLE BLOCKING LAYER PHOTOCONDUCTORS | XEROX CORPORATION (US) | 2009-02-05 | — | — | US | disclosed |
| US-20080305153-A1 | Antibacterial Sol-Gel Coating Solution, Method for Preparing Antibacterial Sol-Gel Coating Solution, Antibacterial Articles, and Method and Equipments for Preparing Antibacterial Articles | QINHUANGDAO YIPENG SPECIAL GLASS CO, LTD (CN) | 2008-12-11 | — | — | US | disclosed |
| EP-1975132-A1 | ANTIBACTERIAL SOL-GEL COATING SOLUTION, METHOD FOR PREPARING ANTIBACTERIAL SOL-GEL COATING SOLUTION, ANTIBACTERIAL ARTICLES, AND METHOD AND EQUIPMENTS FOR PREPARING ANTIBACTERIAL ARTICLES | Qinhuangdao Yipeng Special Glass Co., Ltd (CN) | 2008-10-01 | — | — | EP | disclosed |