SCHEMBL9685052

SCHEMBL9685052

CC(=O)OCc1c(C)c(C)c(COC(C)=O)c(C)c1C

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.50
HSD17B10 Q99714 3/20 0.50
LMNA P02545 1/20 0.50
CA2 P00918 1/20 0.48
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
KDM4E B2RXH2 2/20 0.38
CYP3A4 P08684 1/20 0.36
CHRM5 P08912 2/20 0.36
CHRM1 P11229 2/20 0.36
CHRM3 P20309 2/20 0.36
PGR P06401 1/20 0.36
CHRM2 P08172 1/20 0.36
CHRM4 P08173 1/20 0.36
HTR1A P08908 1/20 0.36
CHRNB2 P17787 1/20 0.36
TBXA2R P21731 1/20 0.36
CHRNB4 P30926 1/20 0.36
CHRNA3 P32297 1/20 0.36
CHRNA7 P36544 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13034117 0.97 ALDH1A1 (0.48) ALDH1A1HSD17B10LMNACA2MEN1
SCHEMBL4168639 0.95 ALDH1A1 (0.50) ALDH1A1HSD17B10LMNACA2MEN1
SCHEMBL13034154 0.84 MEN1 (0.48) ALDH1A1HSD17B10LMNACA2MEN1
SCHEMBL1786267 0.80 MEN1 (0.43) ALDH1A1HSD17B10LMNACA2MEN1
SCHEMBL8415220 0.80 CA2 (0.42) ALDH1A1HSD17B10LMNACA2MEN1
SCHEMBL14192901 0.80 CA2 (0.42) ALDH1A1HSD17B10LMNACA2MEN1
SCHEMBL22758888 0.78 CA2 (0.41) ALDH1A1HSD17B10LMNACA2MEN1
SCHEMBL7595235 0.77 CA2 (0.47) ALDH1A1HSD17B10LMNACA2MEN1
SCHEMBL19270496 0.77 CA2 (0.68) ALDH1A1HSD17B10LMNACA2MEN1
SCHEMBL11358286 0.75 CA2 (0.71) ALDH1A1HSD17B10LMNACA2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5122442-A Water soluble binder; photosensitive compound HOECHST CELANESE CORPORATION (US) 1992-06-16 US disclosed
EP-0212482-B1 PROCESS FOR OBTAINING NEGATIVE IMAGES FROM POSITIVE PHOTORESISTS HOECHST CELANESE CORPORATION (US) 1989-04-19 EP disclosed
EP-0212482-A2 Process for obtaining negative images from positive photoresists HOECHST CELANESE CORPORATION (US) 1987-03-04 EP disclosed
EP-0061150-B1 LIGHT-SENSITIVE POLYCONDENSATION PRODUCT, PROCESS FOR ITS PREPARATION AND LIGHT-SENSITIVE RECORDING MATERIAL CONTAINING THE SAME AMERICAN HOECHST CORPORATION (US) 1986-10-15 EP disclosed
US-4436804-A Light-sensitive polymeric diazonium condensates and reproduction compositions and materials therewith AMERICAN HOECHST CORPORATION (US) 1984-03-13 US disclosed
EP-0061150-A1 Light-sensitive polycondensation product, process for its preparation and light-sensitive recording material containing the same AMERICAN HOECHST CORPORATION (US) 1982-09-29 EP disclosed