Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.46 |
| ▸ | GPR35 | Q9HC97 | 2/20 | 0.46 |
| ▸ | MAOB | P27338 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 3/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | ERN1 | O75460 | 1/20 | 0.41 |
| ▸ | THRB | P10828 | 1/20 | 0.41 |
| ▸ | FBP1 | P09467 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11240270 | 0.91 | GPR35 (0.47) | ALDH1A1TDP1GPR35MAOBTSHR | |
| SCHEMBL27408702 | 0.91 | TDP1 (0.50) | ALDH1A1TDP1GPR35MAOBTSHR | |
| SCHEMBL159208 | 0.89 | ALDH1A1 (0.42) | ALDH1A1TDP1GPR35MAOBTSHR | |
| SCHEMBL27408562 | 0.89 | MAOB (0.46) | ALDH1A1TDP1GPR35MAOBTSHR | |
| SCHEMBL14253713 | 0.89 | ALDH1A1 (0.40) | ALDH1A1TDP1GPR35MAOBTSHR | |
| SCHEMBL8703260 | 0.88 | TSHR (0.55) | ALDH1A1TDP1MAOBTSHRL3MBTL1 | |
| SCHEMBL11025770 | 0.84 | MAOB (0.41) | ALDH1A1TDP1GPR35MAOBTSHR | |
| SCHEMBL15969165 | 0.82 | ALDH1A1 (0.44) | ALDH1A1TDP1GPR35TSHRL3MBTL1 | |
| SCHEMBL1108184 | 0.81 | MAOB (0.61) | ALDH1A1MAOBTSHRL3MBTL1HTT | |
| SCHEMBL27715899 | 0.81 | KMT2A (0.46) | ALDH1A1TDP1GPR35L3MBTL1HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103476767-B | Heterocyclic compounds as PI3 kinase inhibitors | HOFFMANN LA ROCHE | 2015-06-10 | — | — | CN | disclosed |
| US-7645812-B2 | Thin film transistor and flat panel display including the same | SAMSUNG MOBILE DISPLAY CO., LTD. (KR) | 2010-01-12 | — | — | US | disclosed |
| US-7579131-B2 | Positive resist composition and method of forming resist pattern using the same | FUJIFILM CORPORATION (JP) | 2009-08-25 | — | — | US | disclosed |
| US-7579131-B2 | Positive resist composition and method of forming resist pattern using the same | FUJIFILM CORPORATION (JP) | 2009-08-25 | — | — | US | disclosed |
| US-7521168-B2 | Compound that has a reduction potential higher than that of diphenyl iodonium salt and generates an acid upon irradiation of an actinic ray or radiation. | FUJIFILM CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-7214467-B2 | Photosensitive resin composition | FUJIFILM CORPORATION (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7214467-B2 | Photosensitive resin composition | FUJIFILM CORPORATION (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7202015-B2 | Positive photoresist composition and pattern making method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-04-10 | — | — | US | disclosed |
| US-7202015-B2 | Positive photoresist composition and pattern making method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-04-10 | — | — | US | disclosed |
| US-7198880-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-04-03 | — | — | US | disclosed |
| US-7198880-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-04-03 | — | — | US | disclosed |
| US-7163776-B2 | Positive-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7163776-B2 | Positive-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7160666-B2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-09 | — | — | US | disclosed |
| US-7160666-B2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-09 | — | — | US | disclosed |
| US-7157206-B2 | Resin containing an acid-decomposable group such as bis(trifluoromethyl)methanol group, to generate alkali-soluble group, and acid generators selected from fluorine-substituted or non-fluorine substituted aromatic or aliphatic carboxylic acid generators or sulfonic acid generators; microlithography | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7157206-B2 | Resin containing an acid-decomposable group such as bis(trifluoromethyl)methanol group, to generate alkali-soluble group, and acid generators selected from fluorine-substituted or non-fluorine substituted aromatic or aliphatic carboxylic acid generators or sulfonic acid generators; microlithography | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| EP-0268989-B1 | IMIDAZOPYRIDINE COMPOUNDS AND PROCESSES FOR PREPARATION THEREOF | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1992-07-08 | — | — | EP | disclosed |
| US-4831041-A | ANTIULCER AGENTS | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1989-05-16 | — | — | US | disclosed |
| EP-0268989-A1 | Imidazopyridine compounds and processes for preparation thereof | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1988-06-01 | — | — | EP | disclosed |