Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RAB9A | P51151 | 9/20 | 0.74 |
| ▸ | NPC1 | O15118 | 8/20 | 0.74 |
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.74 |
| ▸ | LMNA | P02545 | 6/20 | 0.74 |
| ▸ | PKM | P14618 | 2/20 | 0.74 |
| ▸ | MAPT | P10636 | 6/20 | 0.71 |
| ▸ | L3MBTL1 | Q9Y468 | 5/20 | 0.71 |
| ▸ | MEN1 | O00255 | 5/20 | 0.71 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.71 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.71 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.71 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.65 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.65 |
| ▸ | HTT | P42858 | 2/20 | 0.61 |
| ▸ | CYSLTR2 | Q9NS75 | 2/20 | 0.56 |
| ▸ | CYSLTR1 | Q9Y271 | 2/20 | 0.56 |
| ▸ | GLA | P06280 | 2/20 | 0.56 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.53 |
| ▸ | ECE2 | P0DPD6 | 2/20 | 0.53 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30708723 | 1.00 | RAB9A (0.74) | RAB9ANPC1KDM4ELMNAPKM | |
| SCHEMBL9170782 | 0.91 | RAB9A (0.89) | RAB9ANPC1KDM4ELMNAPKM | |
| SCHEMBL9170780 | 0.91 | RAB9A (0.89) | RAB9ANPC1KDM4ELMNAPKM | |
| SCHEMBL659666 | 0.85 | RAB9A (1.00) | RAB9ANPC1KDM4ELMNAPKM | |
| SCHEMBL659665 | 0.85 | RAB9A (1.00) | RAB9ANPC1KDM4ELMNAPKM | |
| SCHEMBL30708719 | 0.85 | RAB9A (1.00) | RAB9ANPC1KDM4ELMNAPKM | |
| SCHEMBL28443608 | 0.83 | RAB9A (0.80) | RAB9ANPC1KDM4ELMNAPKM | |
| SCHEMBL8617773 | 0.83 | RAB9A (1.00) | RAB9ANPC1KDM4ELMNAPKM | |
| SCHEMBL9594355 | 0.83 | RAB9A (1.00) | RAB9ANPC1KDM4ELMNAPKM | |
| SCHEMBL1899504 | 0.83 | RAB9A (0.74) | RAB9ANPC1KDM4ELMNAPKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116283756-B | Preparation method of N-heteroaryl stilbene compound | 常州大学 | 2025-06-24 | — | — | CN | disclosed |
| CN-116804026-B | Method for preparing beta-silyl aza-aromatic compound by catalysis of chitosan Schiff base copper-based functional material | 湖北工程学院 | 2025-02-11 | — | — | CN | disclosed |
| CN-117924166-A | Direct alkenylation of methylazaheteroaryl compounds and benzyl alcohols | 常州大学 | 2024-04-26 | — | — | CN | disclosed |
| CN-116804026-A | Method for preparing beta-silyl aza-aromatic compound by catalysis of chitosan Schiff base copper-based functional material | 湖北工程学院 | 2023-09-26 | — | — | CN | disclosed |
| CN-116283756-A | Preparation method of N-heteroaryl stilbene compound | 常州大学 | 2023-06-23 | — | — | CN | disclosed |
| EP-0220589-B1 | PHOTOPOLYMERISABLE COMPOUND AND REGISTRATION MATERIAL CONTAINING IT | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-07-22 | — | — | EP | disclosed |
| US-4737445-A | 2,3-DIHYDRO-1H-CYCLOPENTA(B)QUINOLINE | HOECHST AKTIENGESELLSCHAFT (DE) | 1988-04-12 | — | — | US | disclosed |
| EP-0220589-A2 | Photopolymerisable compound and registration material containing it | HOECHST AKTIENGESELLSCHAFT (DE) | 1987-05-06 | — | — | EP | disclosed |
| EP-0028749-B1 | PHOTOPOLYMERISABLE COMPOSITION AND PHOTOPOLYMERISABLE RECORDING MATERIAL MADE THEREWITH | HOECHST AKTIENGESELLSCHAFT (DE) | 1985-08-07 | — | — | EP | disclosed |
| EP-0011786-B1 | PHOTOPOLYMERISABLE COMPOSITION | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-01-19 | — | — | EP | disclosed |
| US-4304841-A | DISULFIDE COMPOUND TO LOWER SENSITIVITY TO OXYGEN | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-12-08 | — | — | US | disclosed |
| US-4272609-A | 2-ALKENYL QUINOLINE PHOTOINITIATOR | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-06-09 | — | — | US | disclosed |
| EP-0028749-A2 | Photopolymerisable composition and photopolymerisable recording material made therewith | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-05-20 | — | — | EP | disclosed |
| EP-0021429-A2 | Photopolymerisable copy material and process for making relief images | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-01-07 | — | — | EP | disclosed |
| EP-0011786-A2 | Photopolymerisable composition | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-06-11 | — | — | EP | disclosed |