SCHEMBL9716203

SCHEMBL9716203

[O-][n+]1ccc(-c2cccc[n+]2[O-])cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.41
HTT P42858 1/20 0.41
EDNRB P24530 1/20 0.35
EDNRA P25101 1/20 0.35
KMT2A Q03164 2/20 0.33
RAB9A P51151 1/20 0.33
MEN1 O00255 1/20 0.33
CYP3A4 P08684 1/20 0.32
CYP2C19 P33261 1/20 0.32
KDM4E B2RXH2 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
POLB P06746 1/20 0.32
KAT6A Q92794 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
ALDH1A1 P00352 1/20 0.32
SLC22A2 O15244 1/20 0.30
SLC22A1 O15245 1/20 0.30
SLC22A3 O75751 1/20 0.30
SLC6A4 P31645 1/20 0.30
ABCC9 O60706 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31088294 0.86 HTT (0.44) LMNAHTTEDNRBEDNRAKMT2A
SCHEMBL316983 0.86 HTT (0.44) LMNAHTTEDNRBEDNRAKMT2A
SCHEMBL27684655 0.80 LMNA (0.48) LMNAHTTEDNRBEDNRAKMT2A
SCHEMBL871319 0.80 LMNA (0.52) LMNAHTTEDNRBEDNRAKMT2A
SCHEMBL29727517 0.80 LMNA (0.52) LMNAHTTEDNRBEDNRAKMT2A
SCHEMBL6099916 0.78 HSD17B10 (0.44) LMNAHTTEDNRBEDNRAKMT2A
SCHEMBL2947533 0.78 LMNA (0.39) LMNAHTTEDNRBEDNRAKMT2A
SCHEMBL30406224 0.78 LMNA (0.39) LMNAHTTEDNRBEDNRAKMT2A
SCHEMBL28462243 0.78 CYP1A2 (0.44) LMNAHTTEDNRBEDNRAKMT2A
SCHEMBL10845930 0.78 ALDH1A1 (0.44) LMNAHTTEDNRBEDNRAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0397474-A2 Photosensitive composition KABUSHIKI KAISHA TOSHIBA (JP) 1990-11-14 EP claimed
US-5100768-A Photoresists for integrated circuits, polyvinyl phenol and nitrogen containing heterocycle KABUSHIKI KAISHA TOSHIBA (JP) 1992-03-31 US disclosed
EP-0397474-A2 Photosensitive composition KABUSHIKI KAISHA TOSHIBA (JP) 1990-11-14 EP disclosed