⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2141485 | 0.93 | TSHR (0.30) | — | |
| Hydrochloric Acid SCHEMBL4986121 | 0.93 | TSHR (0.30) | — | |
| SCHEMBL337916 | 0.93 | — | — | |
| SCHEMBL635877 | 0.93 | TSHR (0.30) | — | |
| Bromide SCHEMBL10984057 | 0.93 | — | — | |
| Hydrochloric Acid SCHEMBL4986134 | 0.93 | — | — | |
| SCHEMBL10990883 | 0.93 | — | — | |
| Hydrochloric Acid SCHEMBL10842729 | 0.93 | — | — | |
| SCHEMBL21179486 | 0.93 | TSHR (0.30) | — | |
| Iodide SCHEMBL8858866 | 0.93 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4180 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260150594-A1 | COMBINATORIAL PRECURSOR CHEMISTRY FOR LOW TEMPERATURE | APPLIED MATERIALS, INC. (US) | 2026-05-28 | — | — | US | claimed |
| US-12612523-B2 | Fireproof coating material | WeiFang Jia Cheng Digital Materials Co., Ltd. (CN) | 2026-04-28 | — | — | US | claimed |
| US-20260026134-A1 | METHOD AND DEVICE FOR PHOTOSENSOR USING GRADED WAVELENGTH CONFIGURING MATERIALS | AELUMA INC (US) | 2026-01-22 | — | — | US | claimed |
| US-12518962-B2 | Method and system for mixed group V precursor process | IQE PLC (GB) | 2026-01-06 | — | — | US | claimed |
| US-12433061-B1 | Method and device for photosensor using graded wavelength configuring materials | Aeluma, Inc. (US) | 2025-09-30 | — | — | US | claimed |
| US-20250250674-A1 | REVERSE RESISTIVITY IN TOPOLOGICAL SEMIMETAL GROWN BY ATOMIC LAYER DEPOSITION | AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION (KR) | 2025-08-07 | — | — | US | claimed |
| US-20250179668-A1 | PROCESSES FOR FORMING MULTIMETALLIC ALLOY NANOSTRUCTURES | HONDA MOTOR CO., LTD. (JP) | 2025-06-05 | — | — | US | claimed |
| CN-120025254-A | Preparation method of epothilone hydrochloride intermediate | 甘肃皓天医药科技有限责任公司 | 2025-05-23 | — | — | CN | claimed |
| CN-119019229-B | Synthesis method of beta-gem difluorophenethyl alcohol or beta-gem difluorophenethyl ether compound and analogues thereof | 中国科学技术大学 | 2025-04-29 | — | — | CN | claimed |
| CN-119753834-A | Co-doped N-type diamond, preparation method thereof, semiconductor material and semiconductor device | 中国科学院深圳先进技术研究院 | 2025-04-04 | — | — | CN | claimed |
| EP-0369864-A2 | Process for producing aromatic amines | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-05-23 | — | — | EP | claimed |
| EP-0365199-A2 | Vapor phase growth process using organo-group V compounds | AT&T Corp. (US) | 1990-04-25 | — | — | EP | claimed |
| US-4916091-A | Plasma and plasma UV deposition of SiO2 | TEXAS INSTRUMENTS INCORPORATED (US) | 1990-04-10 | — | — | US | claimed |
| US-4869858-A | FROM A DIHALOSILANE OR LEWIS BASE ADDUCT THEREOF, AMMONIA AND OXYGEN OR WATER | TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) | 1989-09-26 | — | — | US | claimed |
| US-4840778-A | Inorganic polysilazane and method of producing the same | TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) | 1989-06-20 | — | — | US | claimed |
| EP-0296257-A1 | Branched monoalkyl group V A compounds as MOCVD element sources | AMERICAN CYANAMID COMPANY (US) | 1988-12-28 | — | — | EP | claimed |
| US-4721683-A | LIQUID PHASE | AMERICAN CYANAMID COMPANY (US) | 1988-01-26 | — | — | US | claimed |
| EP-0237199-A2 | Polysiloxazanes, silicon oxynitride fibers and processes for producing same | TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) | 1987-09-16 | — | — | EP | claimed |
| EP-0228148-A2 | Polyorgano(hydro)silazane and process for producing same | TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) | 1987-07-08 | — | — | EP | claimed |
| US-4659850-A | Polyorgano(hydro)silazane and process for producing same | TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) | 1987-04-21 | — | — | US | claimed |