SCHEMBL9717847

SCHEMBL9717847

C1=CC(C2(C3=CCCC=C3)CCCCC2)=CCC1

nearest known ligand 0.31

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
ESR1 P03372 1/20 0.31
ESR2 Q92731 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18458291 0.80 ESR1 (0.38) ALDH1A1L3MBTL1ESR1ESR2
SCHEMBL18769546 0.76 SIGMAR1 (0.31)
SCHEMBL14106181 0.70
SCHEMBL20207882 0.70
SCHEMBL18769545 0.69 LMNA (0.36)
SCHEMBL19993214 0.67
SCHEMBL12918317 0.65
SCHEMBL2770042 0.65
SCHEMBL11237014 0.65
SCHEMBL10305507 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0500131-A2 Polycarbonate resin solution for film formation by casting MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1992-08-26 EP claimed
US-20230416456-A1 RESIN COMPOSITION, COATING FILM USING SAME, AND ELECTROLYTE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-12-28 US disclosed
EP-4242265-A1 RESIN COMPOSITION, COATING FILM USING SAME, AND ELECTROLYTE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-09-13 EP disclosed