Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7156527 | 0.87 | JAK2 (0.31) | — | |
| SCHEMBL9718917 | 0.78 | CYP2A6 (0.40) | CYP2A6LMNATSHR | |
| SCHEMBL12094366 | 0.75 | — | — | |
| SCHEMBL9718839 | 0.68 | CYP1A2 (0.36) | CYP1A2CYP2A6LMNA | |
| SCHEMBL3243506 | 0.68 | — | — | |
| SCHEMBL5015297 | 0.67 | KDM4E (0.38) | CYP1A2LMNATSHR | |
| SCHEMBL5013871 | 0.67 | KDM4E (0.38) | CYP1A2LMNATSHR | |
| SCHEMBL1438735 | 0.65 | — | — | |
| SCHEMBL2517442 | 0.65 | ALDH1A1 (0.35) | LMNA | |
| SCHEMBL7996476 | 0.65 | ALDH1A1 (0.35) | LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5103027-A | Catalyst selectivity | ARCO CHEMICAL TECHNOLOGY, L.P. (US) | 1992-04-07 | — | — | US | claimed |
| US-11935803-B2 | Resin composition, laminate, semiconductor wafer with resin composition layer, substrate for mounting semiconductor with resin composition layer and semiconductor device | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-03-19 | — | — | US | disclosed |
| US-20210277221-A1 | RESIN COMPOSITION, LAMINATE, SEMICONDUCTOR WAFER WITH RESIN COMPOSITION LAYER, SUBSTRATE FOR MOUNTING SEMICONDUCTOR WITH RESIN COMPOSITION LAYER AND SEMICONDUCTOR DEVICE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-09-09 | — | — | US | disclosed |
| EP-3786200-A1 | RESIN COMPOSITION, LAMINATE, RESIN COMPOSITION LAYER-ATTACHED SEMICONDUCTOR WAFER, SUBSTRATE FOR MOUNTING RESIN COMPOSITION LAYER-ATTACHED SEMICONDUCTOR, AND SEMICONDUCTOR DEVICE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-03 | — | — | EP | disclosed |
| EP-2711398-A1 | MAGNETICALLY ENHANCED RESIN | Tanaka Seimitsu Kogyo Co., Ltd. (JP) | 2014-03-26 | — | — | EP | disclosed |
| US-20140077120-A1 | Magnetically Enhanced Resin | Tanaka Seimitsu Kogyo Co.Ltd. (JP) | 2014-03-20 | — | — | US | disclosed |
| CN-1298721-C | Method of separating, large scale preparing porphyrin from complex reaction system | SHANGHAI INST ORGANIC CHEM (CN) | 2007-02-07 | — | — | CN | disclosed |
| CN-1537854-A | Method of separating, large scale preparing porphyrin from complex reaction system | 中国科学院上海有机化学研究所 | 2004-10-20 | — | — | CN | disclosed |
| US-5103027-A | Catalyst selectivity | ARCO CHEMICAL TECHNOLOGY, L.P. (US) | 1992-04-07 | — | — | US | disclosed |