Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2820292 | 0.91 | ALDH1A1 (0.41) | ALDH1A1FDPS | |
| SCHEMBL308585 | 0.87 | — | — | |
| Phosphine SCHEMBL27893454 | 0.84 | ALDH1A1 (0.41) | ALDH1A1FDPS | |
| SCHEMBL1613219 | 0.84 | ALDH1A1 (0.41) | ALDH1A1FDPS | |
| Ammonia Solution, Strong SCHEMBL2097227 | 0.84 | ALDH1A1 (0.41) | ALDH1A1FDPS | |
| SCHEMBL7754207 | 0.83 | ALDH1A1 (0.45) | ALDH1A1FDPS | |
| SCHEMBL16074902 | 0.83 | ALDH1A1 (0.53) | ALDH1A1FDPS | |
| SCHEMBL16074725 | 0.81 | ALDH1A1 (0.50) | ALDH1A1FDPS | |
| SCHEMBL12496 | 0.81 | — | — | |
| SCHEMBL7754200 | 0.81 | ALDH1A1 (0.64) | ALDH1A1FDPS |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9188866-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9176382-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-03 | — | — | US | disclosed |
| US-20140273447-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140273448-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-5104503-A | Radiation in presence of group 2b metal | YALE UNIVERSITY (US) | 1992-04-14 | — | — | US | disclosed |