Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CDYL | Q9Y232 | 1/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.41 |
| ▸ | NQO2 | P16083 | 1/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | ACP3 | P15309 | 1/20 | 0.38 |
| ▸ | SSTR4 | P31391 | 1/20 | 0.36 |
| ▸ | NR3C1 | P04150 | 1/20 | 0.35 |
| ▸ | NR3C2 | P08235 | 1/20 | 0.35 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL973166 | 1.00 | CDYL (0.43) | CDYLKDM4ENQO2CYP1A2CYP2D6 | |
| SCHEMBL384178 | 0.90 | TDP1 (0.46) | KDM4ENQO2CYP1A2CYP2D6CYP2C19 | |
| SCHEMBL30355311 | 0.90 | TDP1 (0.46) | KDM4ENQO2CYP1A2CYP2D6CYP2C19 | |
| SCHEMBL974523 | 0.89 | TDP1 (0.45) | KDM4ENQO2CYP1A2CYP2D6CYP2C19 | |
| SCHEMBL12308106 | 0.79 | KDM4E (0.39) | KDM4ENQO2CYP1A2CYP2C19TDP1 | |
| SCHEMBL17491049 | 0.79 | NQO2 (0.44) | KDM4ENQO2CYP1A2CYP2D6CYP2C19 | |
| SCHEMBL12039318 | 0.77 | NQO2 (0.49) | KDM4ENQO2CYP1A2CYP2C19TDP1 | |
| SCHEMBL29058341 | 0.76 | MEN1 (0.42) | NQO2CYP2D6CA2SSTR4NR3C1 | |
| SCHEMBL14111166 | 0.76 | TDP1 (0.44) | KDM4ENQO2CYP1A2CYP2D6CYP2C19 | |
| SCHEMBL974521 | 0.74 | CA2 (0.44) | NQO2CYP1A2CYP2D6CYP2C19TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7871761-B2 | Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-01-18 | — | — | US | disclosed |
| US-20080032231-A1 | Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern | SHIN-ETSU CHEMICAL CO., LTD. | 2008-02-07 | — | — | US | disclosed |