SCHEMBL9735792

SCHEMBL9735792

CCCCCCCC/C=C\CCCCCCCCn1ccnc1

nearest known ligand 0.80

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TBXAS1 P24557 15/20 0.80
KDM4E B2RXH2 1/20 0.47
LMNA P02545 1/20 0.47
QPCT Q16769 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4342269 1.00 TBXAS1 (0.80) TBXAS1KDM4ELMNAQPCT
Hydrochloric Acid SCHEMBL10940773 0.98 TBXAS1 (0.77) TBXAS1
Hydrochloric Acid SCHEMBL10940765 0.98 TBXAS1 (0.77) TBXAS1
SCHEMBL28674138 0.93 TBXAS1 (0.69) TBXAS1KDM4ELMNAQPCT
SCHEMBL28237329 0.92 TBXAS1 (0.66) TBXAS1KDM4ELMNAQPCT
SCHEMBL284539 0.89 TBXAS1 (1.00) TBXAS1KDM4ELMNAQPCT
SCHEMBL304926 0.89 TBXAS1 (1.00) TBXAS1KDM4ELMNAQPCT
SCHEMBL521865 0.89 TBXAS1 (1.00) TBXAS1KDM4ELMNAQPCT
SCHEMBL4059134 0.89 TBXAS1 (1.00) TBXAS1KDM4ELMNAQPCT
SCHEMBL413378 0.89 TBXAS1 (1.00) TBXAS1KDM4ELMNAQPCT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117586157-A Salt-resistant antibacterial high-interfacial-activity Gemini foam discharging agent, and preparation method and application thereof 江南大学 2024-02-23 CN claimed
CN-118922586-A Plating solution containing sulfonium group-containing ether compound 株式会社JCU 2024-11-08 CN disclosed
CN-117586157-A Salt-resistant antibacterial high-interfacial-activity Gemini foam discharging agent, and preparation method and application thereof 江南大学 2024-02-23 CN disclosed
CN-110462108-B Electroplating solution 三菱综合材料株式会社 2022-02-01 CN disclosed
CN-107667136-B Composition for producing magnetic core and method for producing the same 巴斯夫欧洲公司 2020-11-17 CN disclosed
CN-106661735-B Palladium plating solution and palladium coating film obtained using the same 日本高纯度化学株式会社 2019-12-10 CN disclosed
CN-110462108-A Electroplate liquid MITSUBISHI MATERIALS CORP 2019-11-15 CN disclosed
CN-107406999-B The electroplate liquid of ammonium salt is used 三菱综合材料株式会社 2019-08-27 CN disclosed
CN-107406998-B The electroplate liquid of sulfosalt is used 三菱综合材料株式会社 2019-08-23 CN disclosed
CN-107429415-B The electroplate liquid of microcosmic salt is used 三菱综合材料株式会社 2019-08-23 CN disclosed
US-20180294083-A1 COMPOSITION FOR PRODUCING MAGNETIC CORES AND A PROCESS FOR PRODUCING THE COMPOSITION BASF SE (DE) 2018-10-11 US disclosed
EP-3304568-A1 COMPOSITION FOR PRODUCING MAGNETIC CORES AND A PROCESS FOR PRODUCING THE COMPOSITION BASF SE (DE) 2018-04-11 EP disclosed
CN-107429415-A The electroplate liquid of microcosmic salt is used 三菱综合材料株式会社 2017-12-01 CN disclosed
CN-107406999-A The electroplate liquid of ammonium salt is used 三菱综合材料株式会社 2017-11-28 CN disclosed
CN-107406998-A The electroplate liquid of sulfosalt is used 三菱综合材料株式会社 2017-11-28 CN disclosed
WO-2016188844-A1 COMPOSITION FOR PRODUCING MAGNETIC CORES AND A PROCESS FOR PRODUCING THE COMPOSITION BASF SE (DE) 2016-12-01 WO disclosed
CN-102105623-B Electrolytic gold plating solution and gold film obtained using same JAPAN PURE CHEMICAL CO LTD 2013-10-02 CN disclosed
CN-102105623-A Electrolytic gold plating solution and gold film obtained using same JAPAN PURE CHEMICAL CO LTD 2011-06-22 CN disclosed
US-5126125-A Decreasing the melanin content in mammalian skin and hair using 5,6-dihydroxindole derivatives YALE UNIVERSITY (US) 1992-06-30 US disclosed
EP-0239826-A1 Skin-tanning compositions containing indole derivatives L'OREAL (FR) 1987-10-07 EP disclosed