⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL263439 | 0.71 | — | — | |
| SCHEMBL3294 | 0.71 | — | — | |
| SCHEMBL131680 | 0.71 | — | — | |
| SCHEMBL465227 | 0.71 | — | — | |
| SCHEMBL8089227 | 0.71 | — | — | |
| SCHEMBL10632871 | 0.71 | — | — | |
| SCHEMBL4352631 | 0.71 | — | — | |
| SCHEMBL3295 | 0.71 | — | — | |
| SCHEMBL8390528 | 0.71 | — | — | |
| SCHEMBL1292 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8871656-B2 | Flowable films using alternative silicon precursors | APPLIED MATERIALS, INC. (US) | 2014-10-28 | — | — | US | disclosed |
| US-20140051264-A1 | FLOWABLE FILMS USING ALTERNATIVE SILICON PRECURSORS | APPLIED MATERIALS, INC. (US) | 2014-02-20 | — | — | US | disclosed |
| WO-2013133942-A1 | FLOWABLE FILMS USING ALTERNATIVE SILICON PRECURSORS | APPLIED MATERIALS, INC. (US) | 2013-09-12 | — | — | WO | disclosed |
| US-8242031-B2 | High quality silicon oxide films by remote plasma CVD from disilane precursors | APPLIED MATERIALS, INC. (US) | 2012-08-14 | — | — | US | disclosed |
| US-20110014798-A1 | HIGH QUALITY SILICON OXIDE FILMS BY REMOTE PLASMA CVD FROM DISILANE PRECURSORS | APPLIED MATERIALS, INC. (US) | 2011-01-20 | — | — | US | disclosed |
| US-7867923-B2 | High quality silicon oxide films by remote plasma CVD from disilane precursors | APPLIED MATERIALS, INC. (US) | 2011-01-11 | — | — | US | disclosed |
| EP-2053143-A2 | High quality silicon oxide films by remote plasma cvd from disilane precursors | Applied Materials, Inc. (US) | 2009-04-29 | — | — | EP | disclosed |
| US-20090104755-A1 | HIGH QUALITY SILICON OXIDE FILMS BY REMOTE PLASMA CVD FROM DISILANE PRECURSORS | APPLIED MATERIALS, INC. (US) | 2009-04-23 | — | — | US | disclosed |