SCHEMBL9745577

SCHEMBL9745577

CCC[SiH](O)C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9747700 0.82
SCHEMBL20421690 0.67 THRB (0.35)
SCHEMBL1325612 0.67
SCHEMBL15915903 0.67
SCHEMBL3626208 0.65
SCHEMBL1827792 0.65
SCHEMBL1828098 0.65
SCHEMBL23701346 0.62
SCHEMBL23701159 0.62
SCHEMBL2272072 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9593192-B2 Method for producing modified polymer and hydrogenated product thereof JSR CORPORATION (JP) 2017-03-14 US claimed
EP-2789633-B1 METHOD FOR MANUFACTURING MODIFIED POLYMER AND HYDROGEN ADDUCT THEREOF JSR CORP (JP) 2016-05-25 EP claimed
EP-2789633-A1 METHOD FOR MANUFACTURING MODIFIED POLYMER AND HYDROGEN ADDUCT THEREOF JSR Corporation (JP) 2014-10-15 EP claimed
US-20140275422-A1 METHOD FOR PRODUCING MODIFIED POLYMER AND HYDROGENATED PRODUCT THEREOF JSR CORPORATION (JP) 2014-09-18 US claimed
US-9593192-B2 Method for producing modified polymer and hydrogenated product thereof JSR CORPORATION (JP) 2017-03-14 US disclosed
EP-2789633-B1 METHOD FOR MANUFACTURING MODIFIED POLYMER AND HYDROGEN ADDUCT THEREOF JSR CORP (JP) 2016-05-25 EP disclosed
EP-2789633-A1 METHOD FOR MANUFACTURING MODIFIED POLYMER AND HYDROGEN ADDUCT THEREOF JSR Corporation (JP) 2014-10-15 EP disclosed
US-20140275422-A1 METHOD FOR PRODUCING MODIFIED POLYMER AND HYDROGENATED PRODUCT THEREOF JSR CORPORATION (JP) 2014-09-18 US disclosed
US-5100762-A Radiation-sensitive polymer and radiation-sensitive composition containing the same MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 1992-03-31 US disclosed