SCHEMBL1827792

SCHEMBL1827792

CCC[SiH](O)CCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzene SCHEMBL28857089 0.89
SCHEMBL1829570 0.87
SCHEMBL2017651 0.85
SCHEMBL9746825 0.84 TSHR (0.39)
SCHEMBL1828102 0.77 TSHR (0.40)
SCHEMBL3626208 0.75
SCHEMBL17024461 0.72 TSHR (0.50)
SCHEMBL17088165 0.72 TSHR (0.50)
SCHEMBL1827406 0.72
Benzene SCHEMBL28857166 0.70 TSHR (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1693350-B1 GLASS SUBSTRATE HAVING PRIMER LAYER FORMED THEREON AND ANTI-FOGGING ARTICLE CENTRAL GLASS CO LTD (JP) 2012-05-02 EP claimed
CN-1898171-B Glass substrate and antifogging article having primer layer formed thereon CENTRAL GLASS CO LTD 2010-08-18 CN claimed
US-7638199-B2 Primer layer formed thereon comprises a hydrolysis product of a hydrolysable silicon compound having an alkylene group and a hydrolysis product of a hydrolysable zirconium compound or hydrolysable titanium compound; improved alkali-washing resistance of anti-fogging article having silicon film thereon CENTRAL GLASS COMPANY, LIMITED (JP) 2009-12-29 US claimed
US-20070099000-A1 Glass substrate having primer layer formed thereon and anti-fogging article CENTRAL GLASS COMPANY LIMITED (JP) 2007-05-03 US claimed
CN-1898171-A Glass substrate having primer layer formed thereon and anti-fogging article CENTRAL GLASS CO LTD (JP) 2007-01-17 CN claimed
EP-1693350-A1 GLASS SUBSTRATE HAVING PRIMER LAYER FORMED THEREON AND ANTI-FOGGING ARTICLE Central Glass Company, Limited (JP) 2006-08-23 EP claimed
CN-113631252-B Method for producing and purifying nanodiamond doped with carbon group element 株式会社大赛璐 2025-05-23 CN disclosed
CN-117794856-A Heteroatom-doped nanodiamond particles and method for producing heteroatom-doped nanodiamond particles 株式会社大赛璐 2024-03-29 CN disclosed
CN-116670501-A Temperature sensitive probe 株式会社大赛璐 2023-08-29 CN disclosed
WO-2022129201-A1 PLATELET-LIKE MATTING AGENT FOR POWDER COATING AND POWDER COATINGS ECKART GMBH (DE) 2022-06-23 WO disclosed
EP-2698403-B1 Surface modified pearlescent pigments and their use in powder coatings ECKART GMBH (DE) 2018-01-03 EP disclosed
US-9680183-B2 Lithium secondary battery and method for producing same TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) 2017-06-13 US disclosed
US-20150244028-A1 NONAQUEOUS SECONDARY CELL, AND FIRE-RETARDANT AGENT AND ADDITIVE FOR NONAQUEOUS SECONDARY CELL WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2015-08-27 US disclosed
US-4661405-A Textiles treated with higher alkyl modified epoxy terpolymeric silicones UNION CARBIDE CORPORATION (US) 1987-04-28 US disclosed
EP-0159568-A2 The use of higher alkyl modified terpolymeric silicones as fiber or textile finishes UNION CARBIDE CORPORATION (US) 1985-10-30 EP disclosed
US-4012401-A USED IN THE PRODUCTION OF POLYURETHANE FOAMS, CYANOALKOXYALKYL-MODIFIED UNION CARBIDE CORPORATION (US) 1977-03-15 US disclosed
US-4003847-A FOR FOAMING POLYETHERURETHANES; CYANOALKYL POLYSILOXANE; POLYETHER SOLVENT UNION CARBIDE CORPORATION (US) 1977-01-18 US disclosed
US-3966784-A CYANOALKYL MODIFIED SILOXANE FLUID UNION CARBIDE CORPORATION (US) 1976-06-29 US disclosed
US-3966650-A HIGH RESILIENCE, CYANOALKOXY-ALKYL MODIFIED SILOXANE FLUID UNION CARBIDE CORPORATION (US) 1976-06-29 US disclosed
US-3952038-A CYANOALKYL MODIFIED SILOXANE FLUID UNION CARBIDE CORPORATION (US) 1976-04-20 US disclosed