SCHEMBL974720

SCHEMBL974720

CC(C)(C)OC(=O)c1cccc2ccccc12

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR4A1 P22736 1/20 0.53
NR4A2 P43354 1/20 0.53
NR4A3 Q92570 1/20 0.53
KMT2A Q03164 4/20 0.53
POLB P06746 2/20 0.53
GAA P10253 1/20 0.53
PLK1 P53350 1/20 0.51
ADRB2 P07550 2/20 0.51
ADRB1 P08588 2/20 0.51
ADRB3 P13945 2/20 0.51
CDC25B P30305 2/20 0.50
MMP3 P08254 1/20 0.49
HDAC8 Q9BY41 1/20 0.49
MEN1 O00255 3/20 0.48
ATM Q13315 2/20 0.48
PTPN1 P18031 1/20 0.47
KDM4E B2RXH2 5/20 0.47
ALDH1A1 P00352 4/20 0.47
HSD17B10 Q99714 2/20 0.46
NPC1 O15118 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14627192 0.89 AR (0.41) NR4A1NR4A2NR4A3KMT2APOLB
SCHEMBL5842837 0.86 KMT2A (0.50) NR4A1NR4A2NR4A3KMT2APOLB
SCHEMBL1415184 0.85 GABRP (0.44) KMT2AGAAPLK1CDC25BMEN1
SCHEMBL30608324 0.85 KMT2A (0.49) NR4A1NR4A2NR4A3KMT2APOLB
SCHEMBL1204440 0.85 KDM4E (0.56) KMT2APOLBGAAADRB2ADRB1
SCHEMBL27594380 0.84 ADRB2 (0.48) NR4A1NR4A2NR4A3KMT2APOLB
SCHEMBL27540990 0.84 NR4A1 (0.55) NR4A1NR4A2NR4A3KMT2APOLB
SCHEMBL13327346 0.83 CDC25B (0.52) NR4A1NR4A2NR4A3KMT2APOLB
SCHEMBL31395544 0.83 KDM4E (0.54) KMT2APOLBGAAADRB2ADRB1
SCHEMBL21641760 0.83 NR4A1 (0.51) NR4A1NR4A2NR4A3KMT2APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107848222-B The method of modified olefine polymer is prepared in an extruder 博里利斯股份公司 2019-08-27 CN claimed
CN-107848222-A The method for preparing modified olefine polymer in an extruder 博里利斯股份公司 2018-03-27 CN claimed
EP-2024272-A2 AMIDE DERIVATIVES AS ION-CHANNEL LIGANDS AND PHARMACEUTICAL COMPOSITIONS AND METHODS OF USING THE SAME Renovis, Inc. (US) 2009-02-18 EP claimed
WO-2007133637-A2 AMIDE DERIVATIVES AS ION-CHANNEL LIGANDS AND PHARMACEUTICAL COMPOSITIONS AND METHODS OF USING THE SAME RENOVIS, INC. (US) 2007-11-22 WO claimed
CN-117413826-A Nanometer emulsion preparation containing trifluoropyridinamine and preparation method thereof 广东真格生物科技有限公司 2024-01-19 CN disclosed
EP-3661900-B1 IRON-CATALYZED TRANSFER HYDROGENATION OF ESTERS TO ALCOHOLS EASTMAN CHEM CO (US) 2023-11-01 EP disclosed
CN-114173772-A Inhibitors of CD40-CD154 binding 托尼克斯医药控股公司 2022-03-11 CN disclosed
CN-110520168-A Soft polypropylene compositions with improved properties BOREALIS AG 2019-11-29 CN disclosed
CN-107848222-B The method of modified olefine polymer is prepared in an extruder 博里利斯股份公司 2019-08-27 CN disclosed
CN-106604962-B Polypropene composition for capacitor films BOREALIS AG (AT) 2019-07-16 CN disclosed
CN-109715725-A High-fluidity automotive exterior compound having excellent surface appearance 博里利斯股份公司 2019-05-03 CN disclosed
CN-108137887-B Multiphase compositions 博里利斯股份公司 2019-04-30 CN disclosed
US-6582878-B2 Coating on substrate chemical amplification resist comprising alkali-soluble base resin, photoacid generator and dissolution inhibitor, exposing coating to patterning radiation to decompose dissolution inhibitor, developing with aqueous base FUJITSU LIMITED (JP) 2003-06-24 US disclosed
US-20030073027-A1 Chemical amplification resist compositions and process for the formation of resist patterns FUJITSU LIMITED (JP) 2003-04-17 US disclosed
US-6200724-B1 CHEMICAL AMPLIFICATION RESIST COMPRISES AN ALKALI-SOLUBLE BASE RESIN, A PHOTOACID GENERATOR AND A DISSOLUTION INHIBITOR, IN WHICH A CYCLIC STRUCTURE FORMS A MATRIX PORTION CONTAINS ONE LONE PAIR CONTAINING PORTION FUJITSU LIMITED (JP) 2001-03-13 US disclosed
CN-1251589-A Substituted triazolopyridazine derivatives as ligands for GABA receptors MERCK SHARP & DOHME (GB) 2000-04-26 CN disclosed
EP-0789278-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-08-13 EP disclosed
US-5362607-A Photo-patternable in absence of moisture; treating substrate with positive resist composition, baking, irradiating resist in patterned way, heating, developing; resist of water-soluble phenolic resin, tertiary butyl compound, aryl onium salt MICROSI, INC. (US) 1994-11-08 US disclosed
US-5310619-A Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable MICROSI, INC. (US) 1994-05-10 US disclosed
US-4921999-A Method for making tertiary butyl esters GENERAL ELECTRIC COMPANY (US) 1990-05-01 US disclosed