SCHEMBL975581

SCHEMBL975581

CCCN(CCC)CCCCO

nearest known ligand 0.50

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.50
LMNA P02545 2/20 0.48
ALDH1A1 P00352 2/20 0.48
HSD17B10 Q99714 1/20 0.48
MEN1 O00255 1/20 0.48
KMT2A Q03164 1/20 0.48
TSHR P16473 1/20 0.48
KDM5A P29375 1/20 0.34
DRD2 P14416 1/20 0.34
DRD4 P21917 1/20 0.34
DRD3 P35462 1/20 0.34
CA12 O43570 1/20 0.33
CA2 P00918 1/20 0.33
CA9 Q16790 1/20 0.33
HTR1A P08908 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL465374 1.00 SMN1; SMN2 (0.50) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1
SCHEMBL1548270 0.97 LMNA (0.52) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1
SCHEMBL18555812 0.97 LMNA (0.52) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1
SCHEMBL465301 0.97 LMNA (0.52) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1
SCHEMBL465288 0.97 LMNA (0.52) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1
SCHEMBL9329960 0.97 LMNA (0.52) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1
SCHEMBL3932580 0.97 LMNA (0.52) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1
SCHEMBL474236 0.97 LMNA (0.52) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1
SCHEMBL1784204 0.97 LMNA (0.52) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1
SCHEMBL19595025 0.95 SMN1; SMN2 (0.46) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 136 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10113049-B2 Thermoplastic resin composition NIPPON NYUKAZAI CO., LTD. (JP) 2018-10-30 US claimed
US-20150329698-A1 THERMOPLASTIC RESIN COMPOSITION NIPPON NYUKAZAI CO., LTD. (JP) 2015-11-19 US claimed
US-20080066644-A1 Alkylmines, alkanolamine compounds, surfactants, a coloring agent and a solvent; combination results in decreased kogation SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-03-20 US claimed
EP-1900785-A1 Ink Composition for Inkjet Recording Samsung Electronics Co., Ltd. (KR) 2008-03-19 EP claimed
EP-0122151-B1 PRODUCTION OF PRIMARY OR SECONDARY ALCOHOL DERIVATIVES OF PHOSPHOLIPIDS BY THE ENZYMATIC TECHNIQUE MEITO SANGYO KABUSHIKI KAISHA (JP) 1989-02-15 EP claimed
WO-2024043115-A1 AMORPHOUS SILICA PARTICLE DISPERSION AND METHOD FOR PRODUCING SAME 学校法人早稲田大学 2024-02-29 WO disclosed
EP-4127118-B1 WATER-GLYCOL HYDRAULIC FLUID COMPOSITION AND SUPPLEMENTARY ADDITIVE THEREFOR SHELL INT RESEARCH (NL) 2023-12-06 EP disclosed
EP-3518874-B1 METHODS, COMPOSITIONS AND USES RELATING THERETO INNOSPEC LTD (GB) 2023-08-16 EP disclosed
WO-2023131780-A1 CORROSION INHIBITOR INNOSPEC LIMITED (GB) 2023-07-13 WO disclosed
WO-2023100501-A1 ADHESIVE FOR SKIN AFFIXATION AND ADHESIVE TAPE FOR SKIN AFFIXATION 東洋インキSCホールディングス株式会社 2023-06-08 WO disclosed
US-20230144254-A1 WATER-GLYCOL HYDRAULIC FLUID COMPOSITION AND SUPPLEMENTARY ADDITIVE THEREFOR SHELL USA, INC. 2023-05-11 US disclosed
EP-4127118-A1 WATER-GLYCOL HYDRAULIC FLUID COMPOSITION AND SUPPLEMENTARY ADDITIVE THEREFOR Shell Internationale Research Maatschappij B.V. (NL) 2023-02-08 EP disclosed
US-20010018129-A1 Process for producing silica-based film, silica-based film, insulating film, and semiconductor device JSR CORPORATION (JP) 2001-08-30 US disclosed
EP-1127929-A2 Composition for film formation, method of film formation, and silica-based film JSR Corporation (JP) 2001-08-29 EP disclosed
EP-1122770-A2 Silica-based insulating film and its manufacture JSR Corporation (JP) 2001-08-08 EP disclosed
EP-1090967-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-11 EP disclosed
EP-1088868-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-04 EP disclosed
US-5723558-A MONOMERS OR MEDICAL MATERIAL, BIOSENSORS AND COSMETICS NOF CORPORATION (JP) 1998-03-03 US disclosed
EP-0790252-A1 FUMARIC ACID DERIVATIVE AND POLYMER THEREOF NOF CORPORATION (JP) 1997-08-20 EP disclosed
US-4438235-A POLYETHERS, POLYESTERS, POLYURETHANES BASF WYANDOTTE CORPORATION (US) 1984-03-20 US disclosed