SCHEMBL465374

SCHEMBL465374

CCCN(CCCCO)CCCCO

nearest known ligand 0.50

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.50
LMNA P02545 2/20 0.48
ALDH1A1 P00352 2/20 0.48
HSD17B10 Q99714 1/20 0.48
MEN1 O00255 1/20 0.48
KMT2A Q03164 1/20 0.48
TSHR P16473 1/20 0.48
KDM5A P29375 1/20 0.34
DRD2 P14416 1/20 0.34
DRD4 P21917 1/20 0.34
DRD3 P35462 1/20 0.34
CA12 O43570 1/20 0.33
CA2 P00918 1/20 0.33
CA9 Q16790 1/20 0.33
HTR1A P08908 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL975581 1.00 SMN1; SMN2 (0.50) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1
SCHEMBL1548270 0.97 LMNA (0.52) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1
SCHEMBL18555812 0.97 LMNA (0.52) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1
SCHEMBL465301 0.97 LMNA (0.52) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1
SCHEMBL465288 0.97 LMNA (0.52) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1
SCHEMBL9329960 0.97 LMNA (0.52) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1
SCHEMBL3932580 0.97 LMNA (0.52) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1
SCHEMBL474236 0.97 LMNA (0.52) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1
SCHEMBL1784204 0.97 LMNA (0.52) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1
SCHEMBL19595025 0.95 SMN1; SMN2 (0.46) SMN1; SMN2LMNAALDH1A1HSD17B10MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 126 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10113049-B2 Thermoplastic resin composition NIPPON NYUKAZAI CO., LTD. (JP) 2018-10-30 US claimed
US-20150329698-A1 THERMOPLASTIC RESIN COMPOSITION NIPPON NYUKAZAI CO., LTD. (JP) 2015-11-19 US claimed
US-20080066644-A1 Alkylmines, alkanolamine compounds, surfactants, a coloring agent and a solvent; combination results in decreased kogation SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-03-20 US claimed
EP-1900785-A1 Ink Composition for Inkjet Recording Samsung Electronics Co., Ltd. (KR) 2008-03-19 EP claimed
EP-3518874-B1 METHODS, COMPOSITIONS AND USES RELATING THERETO INNOSPEC LTD (GB) 2023-08-16 EP disclosed
WO-2023131780-A1 CORROSION INHIBITOR INNOSPEC LIMITED (GB) 2023-07-13 WO disclosed
US-11311471-B2 Methods, compositions and uses relating thereto INNOSPEC LIMITED (GB) 2022-04-26 US disclosed
US-11253453-B2 Reducing colour loss from a dyed material by using an amine salt of a carboxylic acid INNOSPEC LIMITED (GB) 2022-02-22 US disclosed
US-11234917-B2 Methods, compositions and uses relating thereto INNOSPEC LIMITED (GB) 2022-02-01 US disclosed
EP-3518873-B1 METHODS, COMPOSITIONS AND USES RELATING THERETO INNOSPEC LTD (GB) 2022-01-05 EP disclosed
US-10626341-B2 Quaternary ammonium compounds as fuel or lubricant additives INNOSPEC LIMITED (GB) 2020-04-21 US disclosed
US-20200030213-A1 METHODS, COMPOSITIONS AND USES RELATING THERETO INNOSPEC LIMITED (GB) 2020-01-30 US disclosed
US-6410150-B1 Composition for film formation, method of film formation, and insulating film JSR CORPORATION (JP) 2002-06-25 US disclosed
US-6410151-B1 Composition for film formation, method of film formation, and insulating film JSR CORPORATION (JP) 2002-06-25 US disclosed
US-20010018129-A1 Process for producing silica-based film, silica-based film, insulating film, and semiconductor device JSR CORPORATION (JP) 2001-08-30 US disclosed
EP-1127929-A2 Composition for film formation, method of film formation, and silica-based film JSR Corporation (JP) 2001-08-29 EP disclosed
EP-1122770-A2 Silica-based insulating film and its manufacture JSR Corporation (JP) 2001-08-08 EP disclosed
EP-1090967-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-11 EP disclosed
EP-1088868-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-04 EP disclosed
US-4383937-A Aqueous functional fluid compositions CINCINNATI MILACRON INC. (US) 1983-05-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11311471-B2 Methods, compositions and uses relating thereto LPO, AOC1, HAO2 SMN1; SMN2 1324/4885LMNA 501/4885ALDH1A1 163/4885
US-10626341-B2 Quaternary ammonium compounds as fuel or lubricant additives DNMT3A, FANCD2, POLD1 SMN1; SMN2 3140/4885LMNA 3503/4885ALDH1A1 911/4885
US-20200030213-A1 METHODS, COMPOSITIONS AND USES RELATING THERETO LPO, CA7, AOX1 SMN1; SMN2 804/4885LMNA 327/4885ALDH1A1 120/4885
US-11234917-B2 Methods, compositions and uses relating thereto LPO, CA7, AOX1 SMN1; SMN2 804/4885LMNA 327/4885ALDH1A1 120/4885
US-11253453-B2 Reducing colour loss from a dyed material by using an amine salt of a carboxylic acid CA9, CA12, CA7 SMN1; SMN2 303/4885LMNA 1011/4885ALDH1A1 441/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.