⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27099 | 0.75 | — | — | |
| SCHEMBL28852761 | 0.73 | — | — | |
| SCHEMBL525195 | 0.72 | LMNA (0.36) | — | |
| SCHEMBL6970431 | 0.72 | — | — | |
| SCHEMBL344693 | 0.71 | — | — | |
| Hydroxyamine SCHEMBL28342628 | 0.71 | TSHR (0.37) | — | |
| SCHEMBL974528 | 0.69 | — | — | |
| SCHEMBL14217452 | 0.69 | — | — | |
| SCHEMBL1719639 | 0.69 | — | — | |
| SCHEMBL96784 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117923502-A | Quartz micro powder and growth method thereof | 隆基绿能科技股份有限公司 | 2024-04-26 | — | — | CN | claimed |
| CN-117923875-A | Composite board, preparation method and carrier | 隆基绿能科技股份有限公司 | 2024-04-26 | — | — | CN | claimed |
| CN-117923502-A | Quartz micro powder and growth method thereof | 隆基绿能科技股份有限公司 | 2024-04-26 | — | — | CN | disclosed |
| CN-117923875-A | Composite board, preparation method and carrier | 隆基绿能科技股份有限公司 | 2024-04-26 | — | — | CN | disclosed |
| US-11565502-B2 | Bonding method | TOYOTA BOSHOKU KABUSHIKI KAISHA (JP) | 2023-01-31 | — | — | US | disclosed |
| CN-111253867-B | Bonding method | 丰田纺织株式会社 | 2022-05-13 | — | — | CN | disclosed |
| CN-111251698-B | Laminate and method for producing same | 丰田纺织株式会社 | 2022-03-08 | — | — | CN | disclosed |
| CN-105676601-B | Pretreatment method of glass substrate for forming etching mask | 东京应化工业株式会社 | 2020-08-07 | — | — | CN | disclosed |
| CN-111253867-A | Bonding method | 丰田纺织株式会社 | 2020-06-09 | — | — | CN | disclosed |
| CN-111251698-A | Laminate and method for producing same | 丰田纺织株式会社 | 2020-06-09 | — | — | CN | disclosed |
| US-20200171793-A1 | BONDING METHOD | TOYOTA BOSHOKU KABUSHIKI KAISHA (JP) | 2020-06-04 | — | — | US | disclosed |
| US-20020086167-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2002-07-04 | — | — | US | disclosed |
| US-6413647-B1 | USEFUL AS INTERLAYER DIELECTRIC FILM IN SEMICONDUCTOR DEVICES; MECHANICAL STRENGTH | JSR CORPORATION (JP) | 2002-07-02 | — | — | US | disclosed |
| US-6410151-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORPORATION (JP) | 2002-06-25 | — | — | US | disclosed |
| US-6410150-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORPORATION (JP) | 2002-06-25 | — | — | US | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |