SCHEMBL9757304

SCHEMBL9757304

O=C(O)c1cccc2c1CN(Cc1ccccc1)C2

nearest known ligand 0.55

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
PARP1 P09874 2/20 0.46
PTGER4 P35408 1/20 0.46
PTGER2 P43116 1/20 0.46
FABP4 P15090 4/20 0.45
FABP3 P05413 1/20 0.45
NOTUM Q6P988 1/20 0.44
BACE1 P56817 1/20 0.44
ACACB O00763 1/20 0.43
PNMT P11086 1/20 0.43
PREP P48147 1/20 0.42
KCNH2 Q12809 1/20 0.42
HDAC1 Q13547 1/20 0.42
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29870452 0.88 PNMT (0.58) PNMTMEN1KMT2A
SCHEMBL27959646 0.88 PNMT (0.58) PNMTMEN1KMT2A
SCHEMBL9757690 0.88 PARP1 (0.56) PARP1MEN1KMT2A
SCHEMBL6093402 0.85 MEN1 (0.52) PTGER4PTGER2BACE1ACACBMEN1
SCHEMBL12583812 0.79 TNF (0.53) PNMTMEN1KMT2A
Bicarbonate SCHEMBL3912775 0.77 ACACB (0.47) PTGER4PTGER2BACE1ACACBKCNH2
SCHEMBL9605898 0.77 PTPN1 (0.49) PARP1ACACBMEN1KMT2A
SCHEMBL9757453 0.77 PTGER4 (0.46) PTGER4PTGER2BACE1PNMT
SCHEMBL16693831 0.76 SIGMAR1 (0.46) BACE1PNMTKCNH2
SCHEMBL4224502 0.76 SIGMAR1 (0.46) PNMTKCNH2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103923765-A Detergent Composition For Process Of Manufacturing Semiconductors And Displays COWON INNOTECH INC 2014-07-16 CN claimed
US-9869027-B2 Cleaning composition and method of manufacturing metal wiring using the same SAMSUNG DISPLAY CO., LTD. (KR) 2018-01-16 US disclosed
US-20160230289-A1 CLEANING COMPOSITION AND METHOD OF MANUFACTURING METAL WIRING USING THE SAME SAMSUNG DISPLAY CO LTD (KR) 2016-08-11 US disclosed
US-9340759-B2 Cleaning composition and method of manufacturing metal wiring using the same SAMSUNG DISPLAY CO., LTD. (KR) 2016-05-17 US disclosed
US-20150136728-A1 CLEANING COMPOSITION AND METHOD OF MANUFACTURING METAL WIRING USING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2015-05-21 US disclosed
CN-104419326-A Slurry composition for chemical mechanical polishing COWON INNOTECH INC 2015-03-18 CN disclosed
CN-103923765-A Detergent Composition For Process Of Manufacturing Semiconductors And Displays COWON INNOTECH INC 2014-07-16 CN disclosed
CN-101824621-A High-performance copper and nickel protective agent HAINING COATECH METAL SURFACE TECHNOLOGY CO LTD 2010-09-08 CN disclosed
US-5026856-A Bactericides WAKUNAGA SEIYAKU KABUSHIKI KAISHA (JP) 1991-06-25 US disclosed
EP-0343560-A2 Isoindoline derivative WAKUNAGA SEIYAKU KABUSHIKI KAISHA (JP) 1989-11-29 EP disclosed