SCHEMBL976747

SCHEMBL976747

CCCCO[Si](CC[Si](OCCCC)(OCCCC)OCCCC)(OCCCC)OCCCC

nearest known ligand 0.41

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 1/20 0.41
ADRB1 P08588 1/20 0.41
ADRB3 P13945 1/20 0.41
TSHR P16473 5/20 0.36
CYP3A4 P08684 3/20 0.36
ALDH1A1 P00352 1/20 0.35
LMNA P02545 2/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
ATM Q13315 1/20 0.32
THRB P10828 1/20 0.32
CHRM1 P11229 1/20 0.32
CYP2D6 P10635 1/20 0.31
LPAR2 Q9HBW0 3/20 0.31
LPAR3 Q9UBY5 3/20 0.31
HPGD P15428 2/20 0.30
ACHE P22303 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4084291 0.95 ADRB2 (0.38) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL430612 0.92 ADRB2 (0.39) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL15333887 0.92 ADRB2 (0.39) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL149408 0.92 ADRB2 (0.39) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL15333556 0.92 ADRB2 (0.39) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL23493367 0.89 LPAR3 (0.43) TSHRLMNACA1CA2THRB
SCHEMBL15333151 0.89 LMNA (0.38) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL15333743 0.89 LMNA (0.38) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL15332691 0.89 LMNA (0.38) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL15333333 0.89 LMNA (0.38) ADRB2ADRB1ADRB3TSHRCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 138 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250313680-A1 TIRE RUBBER COMPOSITIONS COMBINING BAGASSE-CONTAINING GUAYULE RUBBER WITH SILANE AND RELATED METHODS BRIDGESTONE CORPORATION (JP) 2025-10-09 US disclosed
US-20240059800-A1 MODIFIED GUAYULE RESIN PRODUCT AND RELATED PROCESSES BRIDGESTONE CORPORATION (JP) 2024-02-22 US disclosed
US-20240052139-A1 TIRE RUBBER COMPOSITIONS COMBINING BAGASSE-CONTAINING GUAYULE RUBBER WITH SILANE AND RELATED METHODS BRIDGESTONE CORPORATION (JP) 2024-02-15 US disclosed
EP-4263567-A1 MODIFIED GUAYULE RESIN PRODUCT AND RELATED PROCESSES BRIDGESTONE CORPORATION (JP) 2023-10-25 EP disclosed
EP-4263621-A1 TIRE RUBBER COMPOSITIONS COMBINING BAGASSE-CONTAINING GUAYULE RUBBER WITH SILANE AND RELATED METHODS BRIDGESTONE CORPORATION (JP) 2023-10-25 EP disclosed
WO-2022133478-A1 TIRE RUBBER COMPOSITIONS COMBINING BAGASSE-CONTAINING GUAYULE RUBBER WITH SILANE AND RELATED METHODS BRIDGESTONE CORPORATION (JP) 2022-06-23 WO disclosed
WO-2022133477-A1 MODIFIED GUAYULE RESIN PRODUCT AND RELATED PROCESSES BRIDGESTONE CORPORATION (JP) 2022-06-23 WO disclosed
EP-1520891-B1 FILM FORMING COMPOSITION, PROCESS FOR PRODUCING FILM FORMING COMPOSITION, INSULATING FILM FORMING MATERIAL, PROCESS FOR FORMING FILM, AND SILICA-BASED FILM JSR CORP (JP) 2019-05-01 EP disclosed
US-10025188-B2 Resist pattern-forming method JSR CORPORATION (JP) 2018-07-17 US disclosed
US-20170322492-A1 RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-11-09 US disclosed
US-20020045693-A1 Composition for film formation, method of film formation and silica-based film JSR CORPORATION (JP) 2002-04-18 US disclosed
US-20020020327-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2002-02-21 US disclosed
US-20010055892-A1 Composition for film formation, process for producing composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2001-12-27 US disclosed
US-20010051446-A1 Method of manufacturing insulating film-forming material, the insulating film-forming material, and insulating film JSR CORPORATION (JP) 2001-12-13 US disclosed
EP-1160848-A2 Composition for silica-based film formation JSR Corporation (JP) 2001-12-05 EP disclosed
EP-1148105-A2 Composition for film formation, method of film formation, and silica-based film JSR Corporation (JP) 2001-10-24 EP disclosed
EP-1146092-A2 Composition for film formation, method of film formation, and silica-based film JSR Corporation (JP) 2001-10-17 EP disclosed
EP-1127929-A2 Composition for film formation, method of film formation, and silica-based film JSR Corporation (JP) 2001-08-29 EP disclosed
EP-1090967-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-11 EP disclosed
EP-1088868-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-04 EP disclosed