SCHEMBL976998

SCHEMBL976998

CO[Si](C)(CC[Si](OC)(OC)OC)OC

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4363324 0.87
SCHEMBL557237 0.87
SCHEMBL35673 0.83 LMNA (0.39) LMNA
SCHEMBL22092444 0.83 LMNA (0.39) LMNA
SCHEMBL16248364 0.82 LMNA (0.39) LMNA
SCHEMBL399003 0.82 LMNA (0.39) LMNA
SCHEMBL397854 0.80 LMNA (0.42) LMNA
SCHEMBL16609256 0.80 LMNA (0.42) LMNA
SCHEMBL3791899 0.80 LMNA (0.42) LMNA
SCHEMBL12268402 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 261 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250304819-A1 Flexible and foldable abrasion resistant photopatternable siloxane hard coat OPTITUNE OY (FI) 2025-10-02 US claimed
US-20240093058-A1 POLYSILAZANE HARD COATING COMPOSITIONS MERCK PATENT GMBH (DE) 2024-03-21 US claimed
CN-107636097-B Silicone polymer composition and use thereof 奥普提汀公司 2024-03-15 CN claimed
EP-4274866-A1 POLYSILAZANE HARD COATING COMPOSITIONS Merck Patent GmbH (DE) 2023-11-15 EP claimed
US-11634610-B2 Siloxane polymer compositions and their use OPTITUNE OY (FI) 2023-04-25 US claimed
WO-2022148757-A1 POLYSILAZANE HARD COATING COMPOSITIONS MERCK PATENT GMBH (DE) 2022-07-14 WO claimed
US-20220010172-A1 SILOXANE POLYMER COMPOSITIONS AND THEIR USE OPTITUNE OY (FI) 2022-01-13 US claimed
US-11127864-B2 Carbosiloxane polymer compositions, methods of producing the same and the use thereof OPTITUNE OY (FI) 2021-09-21 US claimed
CN-107636844-B Composition, device containing the composition, method for manufacturing the same, and method for improving battery efficiency 欧提腾股份有限公司 2021-05-28 CN claimed
US-20210087429-A1 Flexible and foldable abrasion resistant photopatternable siloxane hard coat OPTITUNE OY (FI) 2021-03-25 US claimed
EP-3271756-A2 NOVEL CARBOSILOXANE POLYMER COMPOSITIONS, METHODS OF PRODUCING THE SAME AND THE USE THEREOF Optitune Oy (FI) 2018-01-24 EP claimed
WO-2016146896-A1 NOVEL SILOXANE POLYMER COMPOSITIONS AND THEIR USE OPTITUNE OY (FI) 2016-09-22 WO claimed
US-20150056822-A1 COMPOSITIONS AND METHODS USING SAME FOR FLOWABLE OXIDE DEPOSITION AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-02-26 US claimed
EP-2840164-A1 Compositions and methods using same for flowable oxide deposition AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-02-25 EP claimed
US-20130243968-A1 CATALYST SYNTHESIS FOR ORGANOSILANE SOL-GEL REACTIONS AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-09-19 US claimed
EP-2639331-A2 Catalyst synthesis for organosilane sol-gel reactions AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-09-18 EP claimed
US-7932295-B2 Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device JSR CORPORATION (JP) 2011-04-26 US claimed
US-7875317-B2 formed by hydrolyzing and condensing a siloxy compound in the presence of a polycarbosilane; low relative dielectric constant and excellent mechanical strength, storage stability, and chemical resistance; semiconductors JSR CORPORATION (JP) 2011-01-25 US claimed
US-20080246153-A1 ORGANIC SILICA-BASED FILM, METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING INSULATING FILM FOR SEMICONDUCTOR DEVICE, INTERCONNECT STRUCTURE, AND SEMICONDUCTOR DEVICE JSR CORPORATION (JP) 2008-10-09 US claimed
US-7399715-B2 Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device JSR CORPORATION (JP) 2008-07-15 US claimed