Ethylamine

Ethylamine

SCHEMBL977418

CCN.O=CO

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Propylamine SCHEMBL976449 0.85
Formic Acid SCHEMBL31377043 0.82
Propane SCHEMBL3244056 0.82
Alcohol SCHEMBL1052547 0.78
Ethylenediamine SCHEMBL30208060 0.78 TSHR (0.36)
Propane SCHEMBL27928583 0.78
Ethylenediamine SCHEMBL4164753 0.78
Ethylenediamine SCHEMBL6701759 0.78 TSHR (0.36)
Formic Acid SCHEMBL7715351 0.78
Butane SCHEMBL30927845 0.78 ALDH1A1 (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 86 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118302013-A Method for preparing full-band blue perovskite light-emitting diode based on mixed solvent of ionic liquid 暨南大学 2024-07-05 CN claimed
CN-115724808-B Olefin epoxidation method 中国石油化工股份有限公司 2024-05-17 CN claimed
US-8834743-B2 Dicarboxylate gemini surfactant that forms a lyotropic liquid crystal WISCONSIN ALUMNI RESEARCH FOUNDATION (US) 2014-09-16 US claimed
US-20130306907-A1 DICARBOXYLATE GEMINI SURFACTANT THAT FORMS A LYOTROPIC LIQUID CRYSTAL WISCONSIN ALUMNI RESEARCH FOUNDATION (WARF) (US) 2013-11-21 US claimed
US-7867658-B2 Ionic liquids and ionic liquid acids with high temperature stability for fuel cell and other high temperature applications, method of making and cell employing same ARIZONA BOARD OF REGENTS FOR AND ON BEHALF OF ARIZONA STATE UNIVERSITY (US) 2011-01-11 US claimed
EP-2132428-A2 ELECTROLYTIC IGNITER FOR ROCKET ENGINES USING LIQUID PROPELLANTS Snecma (FR) 2009-12-16 EP claimed
WO-2008135693-A2 ELECTROLYTIC IGNITER FOR ROCKET ENGINES USING LIQUID PROPELLANTS SNECMA (FR) 2008-11-13 WO claimed
EP-1618618-A4 IONIC LIQUIDS AND IONIC LIQUID ACIDS WITH HIGH TEMPERATURE STABILITY FOR FUEL CELL AND OTHER HIGH TEMPERATURE APPLICATIONS, METHOD OF MAKING AND CELL EMPLOYING SAME UNIV ARIZONA (US) 2007-12-19 EP claimed
US-20070026295-A1 Ionic liquids &amp; ionic liquid acids with high temperature stability for fuel cell and other high temperature applications, method of making and cell employing same UNITED STATES DEPARTMENT OF ENERGY 2007-02-01 US claimed
JP-2007500429-A 2007-01-11 JP claimed
EP-1618618-A1 IONIC LIQUIDS AND IONIC LIQUID ACIDS WITH HIGH TEMPERATURE STABILITY FOR FUEL CELL AND OTHER HIGH TEMPERATURE APPLICATIONS, METHOD OF MAKING AND CELL EMPLOYING SAME Arizona Board of Regents (US) 2006-01-25 EP claimed
WO-2004114445-A1 IONIC LIQUIDS AND IONIC LIQUID ACIDS WITH HIGH TEMPERATURE STABILITY FOR FUEL CELL AND OTHER HIGH TEMPERATURE APPLICATIONS, METHOD OF MAKING AND CELL EMPLOYING SAME ARIZONA BOARD OF REGENTS A BODY CORPORATE ACTING ON BEHALF OF ARIZONA STATE UNIVERSITY (US) 2004-12-29 WO claimed
EP-0680078-B1 Semiconductor substrate surface treatment MITSUBISHI GAS CHEMICAL CO (JP) 2003-03-12 EP claimed
US-5630904-A Stripping and cleaning agent for removing dry-etching and photoresist residues from a semiconductor substrate, and a method for forming a line pattern using the stripping and cleaning agent MITSUBISHI GAS CHEMICAL CO., INC. (JP) 1997-05-20 US claimed
EP-0680078-A2 Semiconductor substrate surface treatment MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1995-11-02 EP claimed
US-20250242275-A1 APPARATUS AND METHOD FOR PROCESSING A BIOMASS MATERIAL BUSS-SMS-CANZLER GMBH (DE) 2025-07-31 US disclosed
US-20250214937-A1 A METHOD FOR SYNTHESIS OF HALIDE SALTS PEROLINK GMBH (DE) 2025-07-03 US disclosed
US-5206259-A Insecticides, acaricides SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1993-04-27 US disclosed
EP-0394043-A1 An amide compound and its production and use SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1990-10-24 EP disclosed
US-4692554-A MONOMER FOR POLYAMIDES AND POLYIMIDES, FROM HALOBENZENES AND AMINOPHENOL MITSUI TOATSU CHEMICALS, INC. (JP) 1987-09-08 US disclosed