Sulfuric Acid

Sulfuric Acid

SCHEMBL980233

O=S(=O)(O)O.[AlH3].[NaH].[NaH]

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

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

The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL9789944 1.00
Sulfuric Acid SCHEMBL11158994 1.00 CA5A (0.75)
Sulfuric Acid SCHEMBL536289 1.00
Sulfuric Acid SCHEMBL3129142 1.00 CA5A (0.75)
Sulfuric Acid SCHEMBL62672 1.00
Sulfuric Acid SCHEMBL11426795 1.00 CA5A (0.75)
Sulfuric Acid SCHEMBL23199870 0.94
Sulfuric Acid SCHEMBL7643826 0.94
Sulfuric Acid SCHEMBL22207537 0.94 CA5A (0.67)
Sulfuric Acid SCHEMBL749137 0.94 CA5A (0.67)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2152760-B1 NITRILE RUBBERS LANXESS DEUTSCHLAND GMBH (DE) 2011-05-04 EP claimed
US-7923518-B2 Nitrile rubbers LANXESS DEUTSCHLAND GMBH (DE) 2011-04-12 US claimed
EP-2261265-B1 METHOD OF MANUFACTURING PARTICULATE WATER ABSORBENT WITH WATER-ABSORBENT RESIN AS MAIN INGREDIENT, AND MANUFACTURING APPARATUS THEREFOR NIPPON CATALYTIC CHEM IND (JP) 2013-05-08 EP disclosed
US-8420752-B2 Production method and production apparatus of particulate water absorbing agent containing water absorbent resin as main component NIPPON SHOKUBAI CO., LTD. (JP) 2013-04-16 US disclosed
US-20110224361-A1 METHOD FOR PRODUCING PERMEABLE WATER-ABSORBING POLYMER PARTICLES THROUGH POLYMERIZATION OF DROPS OF A MONOMER SOLUTION BASF SE (DE) 2011-09-15 US disclosed
US-20110190441-A1 NITRILE RUBBERS LANXESS DEUTSCHLAND GMBH (DE) 2011-08-04 US disclosed
US-20110123747-A1 Nitrile rubbers which optionally contain alkylthio terminal groups and which are optionally hydrogenated LANXESS DEUTSCHLAND GMBH (DE) 2011-05-26 US disclosed
US-20110118430-A1 Method for Producing Water-Absorbing Polymer Particles BASF SE (DE) 2011-05-19 US disclosed
US-7923518-B2 Nitrile rubbers LANXESS DEUTSCHLAND GMBH (DE) 2011-04-12 US disclosed
EP-2287215-A2 Production method of water-absorbent resin, water-absorbent resin and usage of water-absorbent resin Nippon Shokubai Co., Ltd. (JP) 2011-02-23 EP disclosed
US-20110021725-A1 Production method and production apparatus of particulate water absorbing agent containing water absorbent resin as main component NIPPON SHOKUBAI CO., LTD. (JP) 2011-01-27 US disclosed
EP-2261265-A1 METHOD OF MANUFACTURING PARTICULATE WATER ABSORBENT WITH WATER-ABSORBENT RESIN AS MAIN INGREDIENT, AND MANUFACTURING APPARATUS THEREFOR Nippon Shokubai Co., Ltd. (JP) 2010-12-15 EP disclosed
US-20070041796-A1 Production method of water-absorbent resin, water-absorbent resin, and usage of water-absorbent resin NIPPON SHOKUBAI CO., LTD. (JP) 2007-02-22 US disclosed
EP-1754725-A2 Production method of water-absorbent resin, water-absorbent resin, and usage of water-absorbent resin Nippon Shokubai Co.,Ltd. (JP) 2007-02-21 EP disclosed