Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE known ✓ | P22303 | 7/20 | 0.88 |
| ▸ | BCHE | P06276 | 7/20 | 0.88 |
| ▸ | MEN1 | O00255 | 1/20 | 0.71 |
| ▸ | MAPT | P10636 | 1/20 | 0.71 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.71 |
| ▸ | CASP2 | P42575 | 1/20 | 0.71 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.71 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.71 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL10855939 | 0.97 | BCHE (0.94) | BCHEACHEMEN1MAPTMAPK1 | |
| SCHEMBL8739760 | 0.97 | BCHE (0.93) | BCHEACHE | |
| SCHEMBL3599570 | 0.93 | BCHE (1.00) | BCHEACHE | |
| SCHEMBL3589030 | 0.93 | BCHE (1.00) | BCHEACHE | |
| SCHEMBL3605494 | 0.93 | BCHE (1.00) | BCHEACHE | |
| SCHEMBL3609657 | 0.93 | BCHE (1.00) | BCHEACHE | |
| SCHEMBL3598000 | 0.93 | BCHE (1.00) | BCHEACHE | |
| SCHEMBL4880272 | 0.93 | BCHE (1.00) | BCHEACHE | |
| Hydrochloric Acid SCHEMBL11793089 | 0.93 | BCHE (0.77) | BCHEACHEMEN1MAPTMAPK1 | |
| SCHEMBL3589499 | 0.93 | BCHE (1.00) | BCHEACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2872585-B1 | COMPOSITIONS AND METHODS FOR SELECTIVE POLISHING OF SILICON NITRIDE MATERIALS | CABOT MICROELECTRONICS CORP (US) | 2020-09-09 | — | — | EP | disclosed |
| US-9633863-B2 | Compositions and methods for selective polishing of silicon nitride materials | CABOT MICROELECTRONICS CORPORATION (US) | 2017-04-25 | — | — | US | disclosed |
| EP-2872585-A1 | COMPOSITIONS AND METHODS FOR SELECTIVE POLISHING OF SILICON NITRIDE MATERIALS | Cabot Microelectronics Corporation (US) | 2015-05-20 | — | — | EP | disclosed |
| WO-2014011678-A1 | COMPOSITIONS AND METHODS FOR SELECTIVE POLISHING OF SILICON NITRIDE MATERIALS | CABOT MICROELECTRONICS CORPORATION (US) | 2014-01-16 | — | — | WO | disclosed |
| US-20140017892-A1 | COMPOSITIONS AND METHODS FOR SELECTIVE POLISHING OF SILICON NITRIDE MATERIALS | CMC MATERIALS LLC | 2014-01-16 | — | — | US | disclosed |
| EP-0276497-B1 | PROCESS FOR THE PRODUCTION OF MULTIPLE RADIOGRAPHIC IMAGES | AGFA-GEVAERT N.V. (BE) | 1991-10-09 | — | — | EP | disclosed |
| US-4893021-A | Exposure of multiple photosensitive layers; of fluorescent material and visible light reflectors | AGFA-GEVAERT, N.V. (BE) | 1990-01-09 | — | — | US | disclosed |
| US-4177071-A | HIGH SENSITIVITY TO PENTRATING RADIATION; INSENSITIVE TO FORMATION OF PRESSURE MARKS | AGFA-GEVAERT, N.V. (BE) | 1979-12-04 | — | — | US | disclosed |
| US-4130429-A | X*RAY FLUORESCENT SCREEN, SILVER HALIDE | AGFA-GEVAERT, N.V. (BE) | 1978-12-19 | — | — | US | disclosed |
| US-4130428-A | FLUORESCENT SCREEN | AGFA-GEVAERT, N.V. (BE) | 1978-12-19 | — | — | US | disclosed |